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an undulator

An undulator and fundamental wave technology, applied in the field of synchrotron radiation, can solve the problems of weak auxiliary magnetic field and inability to effectively remove heat load, and achieve the effects of reducing heat load, simple installation and cost saving

Active Publication Date: 2017-02-22
SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] In view of the above-mentioned shortcomings of the prior art, the purpose of the present invention is to provide an undulator, which is used to solve the high heat load when the existing undulator technology produces synchrotron radiation, and the auxiliary energy generated by the four rows of magnets outside the APPLE-Knot undulator. The magnetic field is weak and cannot effectively remove the problem of heat load

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Embodiment Construction

[0047] Embodiments of the present invention are described below through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied through other different specific implementation modes, and various modifications or changes can be made to the details in this specification based on different viewpoints and applications without departing from the spirit of the present invention.

[0048] The undulator of the present invention at least includes: M permanent magnet periods arranged in sequence along the electron beam transmission direction, each permanent magnet period includes four rows of permanent magnet structures, each row of permanent magnet structures includes N rows of permanent magnet groups, and each row of permanent magnets The group includes K permanent magnet units, wherein M, N, and K are all natural...

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Abstract

The present invention provides an undulator, wherein the undulator includes at least: M permanent magnet periods arranged in sequence along the electron beam transmission direction, each of the permanent magnet periods includes four rows of permanent magnet structures, and each row of permanent magnets The magnet structure includes N rows of permanent magnet groups, and each row of permanent magnet groups includes K permanent magnet units, wherein M, N, and K are all natural numbers greater than or equal to 1; the permanent magnet structures of the four rows are paired and opposite It is arranged on both sides of the electron beam transmission direction, and can form at least one composite magnetic field through relative displacement, so that when the electron beam passes through the composite magnetic field, it can generate elliptically polarized light, circularly polarized light, or any polarization angle from 0° to 360° direction of linearly polarized light, and make the direction of electron velocity deviate from the axis direction of the undulator. The invention can generate not only linearly polarized light, but also elliptical and circularly polarized light, and can make the direction of electron velocity never along the axial direction of the undulator, thereby greatly reducing the thermal load of the synchrotron radiation beamline.

Description

technical field [0001] The invention relates to the technical field of synchrotron radiation, in particular to an undulator. Background technique [0002] Synchrotron radiation, the full name of synchrotron radiation, is a high-intensity, highly-collimated beam emitted when high-energy electrons are deflected in a magnetic field. In order to generate higher intensity synchrotron radiation, the current synchrotron radiation devices use a large number of undulators. The undulator generates a periodically changing magnetic field, and the high-energy electron beam performs periodic motion in the undulator, and the generated light has a higher intensity due to the interference effect. With the development of accelerator technology, the divergence of the electron beam current is getting smaller and smaller, and the thermal load (the sum of the power of all energy photons) on the optical elements (such as mirrors, gratings and crystals, etc.) is getting larger and larger. On the ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G21K1/00H01F7/02
CPCG21K1/003H01F7/0278H05H7/04H05H2007/041H01F7/02H05H13/04
Inventor 乔山常睿季福昊叶茂
Owner SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI
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