Making method of spherical layered antimony sulfide film

Abstract

The invention relates to a making method of a spherical layered antimony sulfide film, and belongs to the technical field of production of functional materials through liquid phase deposition. A technical scheme adopted in the invention is characterized in that the method comprises the following steps: dissolving 0.003mol of analytically pure Na2S2O3.5H2O in deionized water, dissolving 0.002mol of analytically pure SbCl3.2H2O in concentrated HCl, mixing the above obtained two solutions, allowing the final volume of the mixed solution to 100ml, magnetically stirring the solution for 5min, and adding ammonia water in a dropwise manner to adjust the pH value of a precursor solution to realize different pH values; carrying out ultrasonic cleaning in distilled water, acetone and anhydrous ethanol for 30min, immersing in a piranha solution, carrying out nitrogen blow drying, and depositing the obtained glass substrate in the film precursor solution; and carrying out heat treatment on films obtained at different deposition temperatures for different deposition times at a certain temperature for 2h to obtain the spherical layered antimony sulfide film. The spherical layered antimony sulfide film is made on the glass substrate through a liquid phase deposition technology, and the method has the advantages of cheap making device, normal temperature and normal pressure making environment, and simple process flow.

Description

technical field [0001] The invention relates to a method for preparing a spherical layered antimony sulfide thin film, which belongs to the technical field of preparation of functional materials by liquid phase deposition. Background technique [0002] Antimony sulfide (Sb 2 S 3 ) is a main group metal sulfide A with a highly anisotropic and orthorhombic layered structure 2 S 3 One of. Antimony sulfide is a direct energy band semiconductor, because its intrinsic energy band system is 1.72eV, it is in the visible light region of the solar spectrum and has a good photon quantum effect, and its excellent photoconductivity and high thermoelectric properties are widely used in various optoelectronic devices. [0003] Commonly used to prepare Sb 2 S 3 Thin film methods include biomimetic method, hydrothermal method, anhydrous chemical deposition method, vapor phase deposition method, pyrolysis method, thermal vacuum spraying method and electroplating method. The above thin...

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Problems solved by technology

The above thin film technologies often require complicated technical equipment or strict preparation environment. For example, the hydrothermal method is completed under high temperature and high pressure environment, while the vapor deposition is realized on a gas phase instrument, and the thermal vacuum spraying method requires a certain degree of vacuum. and protective atmosphere; vapor deposition methods are mostly carried out on capacitively coupled plasma chemical vapor deposition systems. In actual production, due to the high requirements for technical equipment conditions, the equipment is expensive, and the assembly cost is high due to severe corrosion. The cost is generally difficult. accept

In contrast, the high-temperature pyrolysis method has the advantages of simple process equipment and low cost, but its process also has disadvantages. For example, a large amount of organic solvent needs to be added in the preparation process, which not only increases the preparation cost, but also in the subsequent drying and drying process. Organic solvents that are not easy to escape during the calcination process will cause carbon pollution, etc.

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