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Inclined scanning stitching method of write-through lithography system

A technology of oblique scanning and lithography system, which is applied in the field of oblique scanning and splicing of direct-writing lithography system, which can solve the problems of image quality degradation and strip splicing misalignment, etc., and achieve the effect of improving splicing, increasing utilization rate, and improving image quality

Inactive Publication Date: 2015-01-14
TIANJIN JINXIN MICROELECTRONICS TECH CO LTD
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Problems solved by technology

However, in oblique scanning, due to the tilt of the image, a part of the lens at the edge of the DMD cannot be used, resulting in two unused triangular areas of the DMD in both left and right directions (such as figure 1 As shown), it is easy to cause strip splicing misalignment, and the graphics quality is degraded (such as figure 2 shown)

Method used

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  • Inclined scanning stitching method of write-through lithography system
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  • Inclined scanning stitching method of write-through lithography system

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Embodiment 1

[0037] The present invention proposes a method for improving splicing effect under oblique scanning in a direct writing photolithography system. The number of DMD lines used in the present invention is M=512, and the oblique factor N=8. Since the width of a large picture is much larger than that of DMD, it is necessary to expose multiple strips and splicing the strips together to form a complete graphic, so that the graphic quality between the strips is particularly important. important.

[0038] In the tilt scan, the tilt factor is 8, so every 8 rows of lenses in the lower computer, the data is shifted one bit to the right, and the current bit is filled with 0, then 64 times of misplacement and zero filling are required to fill 512 rows of lenses. That is to say, 0 0s are added at the beginning of the first 8 lines, 1 0 is added to the second 8 lines, 2 0s are added to the third 8 lines, and so on, 63 zeros are added to the 64th 8 lines, Such as Figure 5 As shown, (the dot...

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Abstract

The invention discloses digital micromirror device-based (Digital Micromirror Device, DMD) write-through lithography equipment, and provides a method for improving a stitching effect. Existing write-through lithography equipment adopts an inclined scanning mode, so that two unemployed triangular regions are formed on a DMD in the left and right directions. Effective patterns are filled into the triangular regions, and the physical characteristics of 64 CMOSs without lenses in front of and behind the DMD are combined, so that the grey superposition effect is generated on the edges of the adjacent strips. Compared with the prior art, stitching between the strips is improved, the pattern quality is improved, and meanwhile, the utilization rate of the lenses is increased, and popularization and application in industry are facilitated.

Description

technical field [0001] The invention relates to the field of photolithography technology in the semiconductor industry and the printed circuit board industry, in particular to a method for oblique scanning splicing of a direct-write photolithography system. Background technique [0002] DMD (Digital Micro-mirror Device, digital micro-mirror) digital micro-mirror is composed of many tiny aluminized lenses, which can rotate around the yoke with a rotation angle of ±12°, and use the lenses to reflect the incoming light at different rotation angles to different places. The direct writing exposure system uses collimated laser light to inject into the digital micromirror DMD, and the DMD rotates to different positions according to the image data to realize whether the injected laser light reaches the reflective objective lens, and the image is scaled by the objective lens and then projected to the exposure surface on the mobile platform superior. The small lenses on the micromir...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
Inventor 陈修涛王新旺刘涛朱晓飞
Owner TIANJIN JINXIN MICROELECTRONICS TECH CO LTD
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