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Alkali-free glass

An alkali-free glass and glass technology, applied in the field of glass production, can solve the problems of toxicity, low glass bubble effectiveness, low temperature of clarified gas, etc., and achieve the effects of high chemical stability, lower production cost, and lower melting temperature.

Active Publication Date: 2015-01-14
北京远大信达科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, antimony itself poses environmental and health concerns
Although Sb 2 o 3 is not as toxic as As 2 o 3 that high, but Sb 2 o 3 still toxic
Moreover, compared with arsenic, antimony produces clear gas at a lower temperature and is less effective in removing such glass bubbles

Method used

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Embodiment Construction

[0028] A kind of alkali-free glass, the molar percentage of each chemical composition in the described glass is:

[0029] SiO 2 68.5-72%,

[0030] Al 2 o 3 12.6-15%,

[0031] B 2 o 3 1-3.7%,

[0032] MgO 0.1-5.5%,

[0033] CaO 4-7%,

[0034] ZnO 0.05-4%,

[0035] SrO 1-3.5%,

[0036] SnO 0.05-0.1%.

[0037] Preferably, SiO 2 with Al 2 o 3 The sum of the mole percentages is greater than 83%.

[0038] Preferably, SrO / (MgO+CaO+ZnO+SrO)<0.25.

[0039] Preferably, (MgO+ZnO) / (MgO+CaO+ZnO+SrO)>0.35.

[0040] Preferably, 0.82 o 3 <1.2.

[0041] Preferably, Al 2 o 3 The mole percentage of 13-14.5%.

[0042] Preferably, the molar percentage of ZnO is 0.5-3%.

[0043] preferred, B 2 o 3 The mole percentage of 1.5-3.5%.

[0044] Preferably, SiO 2 The mole percentage of 69-71%.

[0045] Preferably, the molar percentage of SrO is 1.5-3.0%.

[0046] During implementation, the raw materials including the corresponding oxide mole percent...

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Abstract

The invention discloses alkali-free glass. The glass comprises the following chemical components by mole percent: 68.5-72% of SiO2, 12.6-15% of Al2O3, 1-3.7% of B2O3, 0.1-5.5% of MgO, 4-7% of CaO, 0.05-4% of ZnO, 1-3.5% of SrO and 0.05-0.1% of SnO. The alkali-free glass has the advantages of high chemical stability, high strain point, high Young modulus, low coefficient of expansion, low melting temperature, low liquidus temperature, and the like. The high temperature viscosity can be obviously reduced via ZnO and MgO in the formula composition, so that the alkali-free glass has lower melting temperature. The material can be widely suitable for manufacturing the glass substrates of flat panel displays, photovoltaic devices or other photoelectric devices and is especially suitable for manufacturing the glass substrates, and the like of TFT-LCD (thin film transistor-liquid crystal display) using the LTPS (low temperature poly-silicon) technology, and OEL (organic electroluminescence).

Description

technical field [0001] The invention belongs to the technical field of glass production, and relates to a formula widely applicable to the production of glass substrates for plane displays, lighting, photovoltaic devices or other optoelectronic devices, in particular to an alkali metal-free alkaline earth aluminosilicate glass . Background technique [0002] With the rapid development of the optoelectronic industry, the demand for various display devices is increasing, such as active matrix liquid crystal display AMLCD, organic light emitting diode OLED and active matrix liquid crystal display LTPS TFT-LCD devices using low temperature polysilicon technology. The devices are based on TFT technology using thin-film semiconductor materials to produce thin-film transistors. The mainstream silicon-based TFT can be divided into amorphous silicon (a-Si) TFT, polycrystalline silicon (p-Si) TFT and single crystal silicon (SCS) TFT, among which amorphous silicon (a-Si) TFT is th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C3/093
CPCC03C3/093C03C2201/10
Inventor 张广涛何豪田鹏沈玉国李俊锋闫冬成王丽红侯建伟
Owner 北京远大信达科技有限公司
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