High-stability surface-enhanced Raman substrate and preparation method thereof
A surface-enhanced Raman, high-stability technology, used in Raman scattering, material excitation analysis, etc., can solve problems such as limitations, poor chemical stability, etc., to prevent oxidation, good surface-enhanced Raman effect, and broad application prospects Effect
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Embodiment 1
[0018] 1. Clean the silicon substrate or glass substrate sequentially with acetone, alcohol and deionized water and dry them;
[0019] 2. Fix the pretreated substrate on the sample stage of the electron beam evaporation coating machine;
[0020] 3. At a temperature of 298K, using metallic silver as the target material, pump the chamber of the electron beam evaporation coating machine to 3×10 -5 Pa high vacuum;
[0021] 4. Adjust the incident angle of the electron beam to 80 degrees, and make the sample stage static, and grow a 250nm thick silver deposition film obliquely on the base of the sample stage;
[0022] 5. By low-temperature atomic layer deposition method, a uniform and dense aluminum oxide film of 0.7nm is deposited on a silver substrate at 50°C to prepare a silver-alumina composite film;
[0023] 6. Configure 10 -6 mol / L rhodamine 6G solution;
[0024] 7. Put the surface-enhanced Raman substrate prepared in steps 1 to 5 into the solution to be tested prepared in...
Embodiment 2
[0029] 1. Clean the silicon wafer substrate or glass substrate sequentially with acetone, alcohol, and deionized water and dry them;
[0030] 2. Fix the pretreated substrate on the sample stage of the electron beam evaporation coating machine;
[0031] 3. At a temperature of 298K, using metallic silver as the target material, pump the chamber of the electron beam evaporation coating machine to 3×10 -5 Pa high vacuum;
[0032] 4. Adjust the incident angle of the electron beam to 83 degrees, and rotate the sample stage at a rate of 10rpm, and grow a 300nm thick silver deposition film obliquely on the substrate of the sample stage;
[0033] 5. By low-temperature atomic layer deposition method, a uniform and dense aluminum oxide film of 1.9nm is deposited on a silver substrate at 60°C to prepare a silver-alumina composite film;
[0034] 6. Configure 10 -6 mol / L rhodamine 6G solution;
[0035] 7. Put the surface-enhanced Raman substrate prepared in steps 1 to 5 into the solutio...
Embodiment 3
[0041] 1. Clean the silicon wafer substrate or glass substrate sequentially with acetone, alcohol, and deionized water and dry them;
[0042] 2. Fix the pretreated substrate on the sample stage of the electron beam evaporation coating machine;
[0043] 3. At a temperature of 298K, using metallic silver as the target material, pump the chamber of the electron beam evaporation coating machine to 3×10 -5 Pa high vacuum;
[0044] 4. Adjust the incident angle of the electron beam to 86 degrees, and make the sample stage static, and grow a 400nm thick silver deposition film obliquely on the base of the sample stage;
[0045] 5. By low-temperature atomic layer deposition method, a uniform and dense aluminum oxide film of 2.6nm is deposited on a silver substrate at 70°C to prepare a silver-alumina composite film;
[0046] 6. Configure 10 -6 mol / L rhodamine 6G solution;
[0047] 7. Put the surface-enhanced Raman substrate prepared in steps 1 to 5 into the solution to be tested prep...
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