Low-temperature photoresist reworking stripping liquid and application thereof

Abstract

The invention relates to low-temperature photoresist reworking stripping liquid and application thereof. The low-temperature photoresist reworking stripping liquid comprises 10-40% of inorganic strong base compound, 0.1-20% of a surfactant, 0.5-10% of a permeating agent, 10-60% of a water-soluble organic solvent and 20-65% of water, wherein the surfactant is selected from alkyl glycosides, fatty alcohol OE-OP block copolymer and amido OE-OP block copolymer; the water-soluble organic solvent is selected from water-soluble alcohol ether solvent and water-soluble amide solvent. By adopting the stripping liquid, various photoresist and the OC glue protective layer on the surface of a color filter can be completely stripped off within 1-3 minutes at the temperature of 50-60 DEG C, and after stripping, the solution can be recycled after being filtered, so that the cost is reduced, and in addition, the stripping liquid is stable in stability, lower in cost and less harmful to person and environment.

Description

technical field [0001] The invention relates to a photoresist heavy-duty stripping solution for removing colored photoresist and OC glue protective layer on a color filter and a preparation method thereof. Background technique [0002] With the increasing maturity of its industry, TFT-LCD has been applied to various flat panel display terminals. Among them, the CF (color filter) process plays a vital role in the quality of the product. CF includes TN mode and ADS mode. The TN mode is composed of glass, color photoresist layer (BM layer, R layer, G layer, B layer, 4 layers in total), and ITO layer. The ADS mode is composed of glass, ITO layer, color photoresist layer (BM layer, R layer, G layer, B layer, 4 layers in total), and OC adhesive layer. [0003] In the above two modes of color photoresist layers, each layer needs to be coated, pre-baked, exposed, developed, post-baked, and etched. The ITO layer is sputtered and coated under an external electric field. bake. It ca...

AI Technical Summary

Problems solved by technology

In the example part of this patent, it is described that the test piece sample is soaked in the stripping solution, and the color resist and the protective layer on the color filter can be removed at a lower temperature (room temperature) and in a shorter time (within 5 minutes), And there is no damage to the glass substrate, yet, according to the test verification of the applicant, the color resist and the protective layer can not be separated after soaking at room temperature for 5 minutes using the stripping solution formula of its embodiment, even after soaking for 1 day. Can not achieve complete peeling effect

In addition, the patented formula is a pure organic solvent type, on the one hand, the cost is high, on the other hand, the alcohols used in it, such as methanol, are poisonous, such as isopropanol, tert-butanol, etc., all have a strong pungent smell, not only for the operator And the environment poses a hazard, and at the same time they are relatively volatile, and the stability of the stripping solution at room temperature and high temperature cannot be guaranteed

In addition, the number of color filters that can be processed by the stripping solution is limited, and the cost of using the stripping solution to strip the color photoresist and protective layer of the color filter is high, which cannot effectively reduce costs for enterprises

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