Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Magneto-rheological finishing method of easy-deliquescence crystals

A magnetorheological polishing and deliquescent technology, which is applied in the field of magnetorheological polishing, can solve the problems of carbonyl iron powder easily embedded in the crystal surface, surface quality damage, crystal atomization, etc., to achieve easy processing and operation, low zero magnetic field viscosity, The effect of less hysteresis loss

Active Publication Date: 2014-10-08
NAT UNIV OF DEFENSE TECH
View PDF7 Cites 14 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, for deliquescent crystals such as KDP crystal materials, it is not suitable to use this water-based magnetorheological polishing fluid for processing: on the one hand, due to the soft texture (Mohs hardness of about 2.4), high brittleness, deliquescence and Easy thermal cracking and other characteristics, using the traditional magnetorheological polishing fluid to shear and remove, it is easy to produce obvious scratches on the crystal surface, carbonyl iron powder in the magnetorheological polishing fluid is easy to embed on the crystal surface and it is difficult to clean after embedding; On the one hand, the water in the magnetorheological polishing liquid is likely to cause crystal atomization. For deliquescent crystal materials, once the surface deliquescence occurs, the surface quality will be irreversibly damaged.
This series of problems makes the current magnetorheological polishing process unsuitable for processing deliquescent crystals such as KDP / DKDP crystals, and the current high-light optical system has an urgent demand for KDP crystal optical components with high surface accuracy. The optical system has extremely high requirements on the various indicators of the KDP crystal, including: aperture, surface shape accuracy, gradient error, PSD1, PSD2, and surface roughness. Due to various reasons, ultra-precision diamond cutting cannot process all these indicators. KDP crystal optical components, therefore, need to study new processing technology to solve these technical problems

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Magneto-rheological finishing method of easy-deliquescence crystals
  • Magneto-rheological finishing method of easy-deliquescence crystals
  • Magneto-rheological finishing method of easy-deliquescence crystals

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0040] A magnetic flow of the Yichang crystal of the present invention. The processing object is a square KDP crystal with a 47mm × 47mm.λ = 632.8nm), no scratches on the surface, and the surface roughness is 1.58nm (RMS).This magnetic flowing method includes the following steps:

[0041] (1) Preparation of non -water -based magnetic flow polishing fluid, according to the quality score, the non -water -based magnetic flow polishing fluid includes 31%diurol monoclonetl ether (477g, 500ml), 59%cymbal iron powder(900g), 5%surfactant (75g), and 5%de -ion water (75g, 75ml).Among them, the viscosity of diol -diol monoclonettharson ether at 20 ° C is 6.49MPa · S; the particle size of the cymbal iron powder is mainly in the range of 1 μm to 10 μm, the average particle size is 5 μm, the net degree of Feine is greater than 97%, and the relative quality factors are greater than the quality factors greater than the factors.1.75, the effective magnetic guidance rate is greater than 3, the pyri...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
surface roughnessaaaaaaaaaa
viscosityaaaaaaaaaa
Login to View More

Abstract

The invention discloses a magneto-rheological finishing method of easy-deliquescence crystals. The method includes the steps of firstly, preparing non-aqueous magneto-rheological finishing solution; secondly, adding the non-aqueous magneto-rheological finishing solution into a magneto-rheological machine tool circulating system for magneto-rheological finishing twice; thirdly, then using aromatic hydrocarbon to clean the easy-deliquescence crystals fast so as to complete the finishing. The method is simple in process flow and high in operability, and high-precision and ultra-smooth easy-deliquescence crystals which can satisfy the high, medium and low frequency band requirements of a strong-light optical system.

Description

Technical field [0001] The present invention involves a magnetic flowing method, which specifically involves a magnetic flow modification method of a moisture -solving crystal to realize the polishing processing of the transit crystal component. Background technique [0002] Magnetic flow polishing technology (MRF) is a new type of optical processing method. It uses the flow of magnetic flow polishing fluid in the magnetic field to polish the workpiece, which can realize the definitance removal and the surface roughness of the nano -level surface. [0003] In the current magnetic flowing processing, the processing materials are mainly optical materials such as fuses, ceramics and silicon carbide. These materials have no moisture characteristics. ThereforeThe removal of the material depends on the polishing powder in the magnetic flowing fluid to cut and remove the material.However, for easy -to -clear crystals such as KDP crystal materials, it is not suitable for processing using...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B24B1/00C09G1/02
CPCB24B1/005C09G1/02
Inventor 戴一帆胡皓陈少山石峰彭小强关朝亮
Owner NAT UNIV OF DEFENSE TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com