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Method for manufacturing photocatalysis self-cleaning mask

A self-cleaning and photocatalytic technology, applied in the field of photocatalytic self-cleaning mask preparation, can solve the problems of low protective efficiency of ordinary masks, and achieve the effects of improving self-cleaning efficiency, good self-cleaning effect and lasting effect

Active Publication Date: 2014-08-20
DONGHUA UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, for dust particles and germs that are smaller than the mesh size of the gauze, the protective effect of ordinary masks is often very low

Method used

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  • Method for manufacturing photocatalysis self-cleaning mask
  • Method for manufacturing photocatalysis self-cleaning mask
  • Method for manufacturing photocatalysis self-cleaning mask

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0045] A preparation method of photocatalytic self-cleaning mask, the specific steps are:

[0046] (1) Preparation of TiO 2 / SiO 2 Mixed sol:

[0047] As shown in Figure 1, 2ml of tetraisopropyl titanate with a mass fraction of 97% and 10ml of absolute ethanol were mixed, and stirred at a stirring speed of 800 rpm for 0.5 hours at room temperature.

[0048] Add 5 ml of ethyl orthosilicate to a mixed solution of 10 ml of ethanol and 1 ml of deionized water under stirring, and then add 0.2 ml of HCL with a mass fraction of 10% to make the pH 2 and ultrasonic treatment and acidification at room temperature for 30 minutes. The reaction equation is as follows:

[0049] 1) Hydrolysis reaction

[0050] Si(OC 2 H 5 ) 4 +4H 2 O→Si(OH) 4 +4C 2 H 5 OH

[0051] 2) Polymerization

[0052]

[0053] The tetraisopropyl titanate dissolved in absolute ethanol was added dropwise to the ethyl orthosilicate solution prepared in the previous step at a rate of 1 drop per second, and ultrasonic treatment was pe...

Embodiment 2

[0067] (1) Preparation of TiO 2 / SiO 2 Mixed sol

[0068] Mix 2ml of tetraisopropyl titanate with a mass fraction of 95%, 10ml of ethyl orthosilicate and 40ml of absolute ethanol, and stir for one hour at a stirring speed of 800rpm at room temperature, which is called solution A; the mass fraction of 0.5ml is Mix 37% HCl, 20ml ethanol, and 3ml deionized water to make the pH value 3, and stir for 0.5 hours at 800rpm at room temperature, which is called B solution. Then slowly add B solution to A solution at a rate of 3 drops / sec, stir for 1 hour, then add 5g of PEG with a molecular weight of 4000KDa, heat to 60°C, stir for 1 hour, and age for 2 hours to obtain TiO 2 / SiO 2 Mix the sol.

[0069] (2) Mask pretreatment

[0070] Remove impurities from a 17.5×9cm mask with a gram weight of 200g / piece. Use non-ionic detergent 3% (owf) Sandoclean PC to clean at 40°C for 30 minutes under the action of ultrasound, and then use deionized water under the action of ultrasound. Wash for 0.5 hour...

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PUM

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Abstract

The invention provides a method for manufacturing a photocatalysis self-cleaning mask. The method is characterized by including the specific steps of firstly, preparing TiO2 / SiO2 mixed sol; secondly, removing impurities on the mask, cleaning the mask, and conducting radio frequency plasma preprocessing on the mask; thirdly, soaking the mask where radio frequency plasma preprocessing is conducted in the TiO2 / SiO2 mixed sol, conducting the twice-soaking and twice-rolling process, drying the mask for three minutes to eight minutes at the temperature of 70 DEG C to 90 DEG C, curing the mask for one minute to five minutes at the temperature of 100 DEG C to 150 DEG C, cleaning the mask through deionized water, drying the mask under the natural condition, and obtaining the photocatalysis self-cleaning mask. The photocatalysis self-cleaning mask manufactured through the method is good in self-cleaning effect and durable in effect. The method can be applied to industrial production.

Description

Technical field [0001] The invention relates to a preparation method of a photocatalytic self-cleaning mask, which belongs to the field of textile fabric finishing. Background technique [0002] Since the beginning of the 21st century, human industrial civilization has developed rapidly, and the environmental pollution caused by this has become increasingly serious. In today's increasingly prosperous and developing economy, the problem of environmental pollution has become a focal issue that directly threatens the survival of mankind and needs to be resolved urgently. Moreover, with the development of the world economy, personnel exchanges have been unprecedentedly frequent, and the possibility of various diseases, especially infectious diseases, is increasing rapidly. Some sudden diseases have large-scale outbreaks. How to prevent various sudden diseases has become a human face A major issue of In addition to improving the national public health care system and raising public ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A41D13/11
Inventor 高晶李婉迪王璐刘军汤宏宇
Owner DONGHUA UNIV
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