TFT (thin film transistor) glass substrate reducer, preparation method thereof and TFT glass substrate reducing process

Abstract

The invention provides a TFT (thin film transistor) glass substrate reducer. The TFT glass substrate reducer comprises 10-12% of hydrofluoric acid, 4-6% of ammonium bifluoride, 5-8% of nitric acid, 5-8% of sulfuric acid and the balance of water. The TFT glass substrate reducer is characterized by mixing all the components of the TFT glass substrate reducer together, thus obtaining a finished product. The TFT glass substrate reducer can stabilize the etching rate, has better borosilicate glass material etching effects, and can effectively control amplification of pits and scratch defects of the glass in a chemical etching process, soften the glass powder to solve the problem of edge raising in the etching process and meet the TFT glass substrate reducing quality requirement safely, stably and effectively, thus meeting the requirements of customers.

Description

technical field [0001] The invention relates to the field of TFT glass substrate thinning, in particular to a TFT glass substrate thinning solution and a preparation method thereof, and also relates to a TFT glass substrate thinning process. Background technique [0002] There are currently two methods of thinning liquid crystal displays, one is physical polishing and grinding, and the other is chemical etching. Among them, chemical thinning glass has the following characteristics: [0003] 1. Short thinning time; [0004] 2. High thinning output; [0005] 3. The composition is simple and the preparation is relatively easy. [0006] At present, there are manufacturers that thin TFT glass, most of which use hydrofluoric acid as the main raw material, and some only use a single hydrofluoric acid solution. This method has the following disadvantages: 1. Direct contact with hydrofluoric acid, high toxicity, And this liquid medicine is easy to produce hydrofluoric acid gas, es...

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Problems solved by technology

[0006] At present, there are manufacturers that thin TFT glass, most of which use hydrofluoric acid as the main raw material, and some only use a single hydrofluoric acid solution. This method has the following disadvantages: 1. Direct contact with hydrofluoric acid, high toxicity, And this liquid medicine is easy to produce hydrofluoric acid gas, especially during the preparation process, the danger is high, if it is supplemented by heating, the danger is even higher; 2, the etching process produces white insoluble matter, which is easily suspended in the etching solution and Adhesive to pipe groove walls, difficult to handle

Moreover, the insoluble matter has strong adsorption and is easy to adhere to the surface of the FPD glass, causing the edge of the TFT glass substrate to bulge, which has a great impact on the appearance yield and post-processing of the TFT glass substrate; 3. During the production process The rate is unstable and the utilization rate is low; 4. Due to the low utilization rate, the waste liquid treatment is difficult, and the matching waste liquid treatment cost is high; 5. During the etching process, pits and scratches on the glass will cause enlarge

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