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Single-acid micro adding device and method

A technology of adding devices and single acid, which is applied in the field of wet etching equipment, can solve the problems of unstable etching rate of the process, large fluctuations in the concentration of single acid A, and short acid change cycle, so as to maintain the metal etch rate, prolong the acid change cycle, The effect of monoacid concentration stabilization

Active Publication Date: 2005-12-21
HONG FU JIN PRECISION IND (SHENZHEN) CO LTD +1
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Problems solved by technology

[0006] When the monitoring of the single-acid acid measuring instrument 113 shows that the concentration of the single-acid A in the mixed-acid tank 112 is close to the lower limit of the concentration required by the process, it is necessary to suspend the etching. The concentration of single acid A in the mixed acid fluctuates greatly, the etching rate of the process is unstable, and the acid change period is short

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  • Single-acid micro adding device and method

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Embodiment Construction

[0016] see figure 2 , is a structural schematic diagram of an embodiment of the monoacid micro-addition device of the present invention. This single acid trace addition device 20 comprises an etching unit 201, a monitoring adding unit 202 and a central chemical supply unit 203, and the etching unit 201 comprises an etching chamber 211, a mixed acid tank 212 and a pump 2120; the monitoring adding unit 202 It includes a single-acid acid measuring instrument 213 , a single-acid replenishment calculator 214 , two single-acid addition tanks 215 and two metering pumps 2150 ; the central chemical supply unit 203 includes two single-acid storage tanks 2161 and a mixed-acid storage tank 2162 .

[0017] The mixed acid liquid of this mixed acid tank 212 is injected in this etching chamber 211 from the top by the pump 2120 that is connected with it; Mixed acid finishes the etching step to metal in etching chamber 211; The waste liquid after etching is discharged back to the mixed acid t...

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Abstract

The invention discloses a single acid trace adding device which consists of a etching unit and an adding monitor unit. The etching unit includes a etch room and a acid blending socket; the monitor unit includes a single acid test device, a single acid compensation calculator and a single acid adding socket; the test device is connected with the blending socket, the calculator is connected with the test device and the adding socket while the adding socket is connected with the blending socket; the blending socket, test device, calculator and the adding socket are connected in turn end to end forming the close single acid adding circuit.

Description

【Technical field】 [0001] The invention relates to a wet etching device, in particular to a monoacid micro-addition device and a monoacid micro-addition method in a wet etching machine. 【Background technique】 [0002] Wet Etching (Wet Etching) technology is widely used in Thin-Film Transistor Liquid Crystal Display (TFT-LCD) due to its low cost, high yield, reliability, and good selectivity to mask and base materials. It is widely used in the etching process of metal in the front-end process, such as the etching of molybdenum / aluminum / molybdenum layer. In the wet etching process, the most commonly used etchant (Etchant) is a mixed acid containing a certain proportion of monoacids. However, the concentration of one of the monoacids often changes with the increase of the etching process time, resulting in a decrease in the etching rate. Changes make the etching uneven, requiring reprocessing or even product scrapping. Therefore, it is particularly important to keep the concen...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/08
Inventor 黄昌桂黄荣龙欧振宪高胜洲
Owner HONG FU JIN PRECISION IND (SHENZHEN) CO LTD
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