Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Double-tank groove etching machine

An etching machine and groove technology, which is applied in the field of electronic component etching processing devices, can solve the problems of incomplete cleaning, slow corrosion speed in large areas, uneven etching surface, etc., and achieve simple control, improved cleaning effect, and uniform cleaning Effect

Active Publication Date: 2014-06-04
山东联盛电子设备有限公司
View PDF4 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Aiming at the deficiencies of the prior art, the purpose of the present invention is to provide a double-groove groove etching machine, which can solve the problems of uneven etching surface, slow corrosion speed in large areas, and incomplete cleaning

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Double-tank groove etching machine
  • Double-tank groove etching machine
  • Double-tank groove etching machine

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 2

[0037] Example 2, such as Figure 6 As shown, the only difference between this embodiment and Embodiment 1 is that the bottom surface 24 of the pickling tank is an arc surface adapted to the outer surface of the rotating basket. The pickling tank 3 is provided with a cooling coil 25, and the cooling coil 25 is connected with a cooling liquid circulation device. The first servo motor, the second servo motor, and the third drive motor are all arranged below the top surface of the cleaning tank and the washing tank and are isolated from the cleaning tank and the washing tank by a sealing plate, so that the motors can be corroded by acid liquid.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a double-tank groove etching machine. The double-tank groove etching machine comprises a frame, wherein the frame is provided with an acid washing tank and a water washing tank, wherein a conveying device is arranged between the acid washing tank and the water washing tank; a rotating basket is movably connected to the conveying device; the conveying device can be used for feeding the rotating basket into the acid washing tank to be etched and feeding the rotating basket into the water washing tank to be cleaned; the rotating basket rotates along axes of the rotating basket; and the conveying device is connected with a power output device through a transmission device; the power output device is connected with a PLC (Programmable Logic Controller) through a circuit; and the PLC is connected with the power output device to control the work of the power output device. By adopting the double-tank groove etching machine, the problems of non-uniform etching surface, low large-area corrosion speed and incomplete cleaning can be solved.

Description

technical field [0001] The invention relates to an etching processing device for electronic components, in particular to a double-groove groove etching machine. Background technique [0002] Etching machines are mainly used in aviation, machinery, and signage industries. Etching machine technology is widely used in the processing of weight-reducing instrument panels, nameplates, and thin workpieces that are difficult to process by traditional processing methods. Etching is an indispensable technology in semiconductor and circuit board manufacturing processes. It can also etch patterns, patterns and geometric shapes on the surface of various metals such as iron, copper, aluminum, titanium gold, stainless steel, zinc plate, and other metals and metal products, and can accurately hollow out. It can also professionally etch and cut thin plates for various types of domestic and imported stainless steel. Now it is widely used in gold card label processing, mobile phone button pro...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C23F1/08
Inventor 马玉水
Owner 山东联盛电子设备有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com