Trench type insulated gate bipolar transistor capable of double-terminal control and preparation method thereof
A bipolar transistor and trench technology, applied in the manufacture of transistors, semiconductor devices, semiconductor/solid-state devices, etc., can solve the problems of weak reverse blocking capability, bidirectional devices with little forward blocking capability, etc. The effect of low power loss, elimination of tail current, and shortened turn-off time
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[0038] The present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments.
[0039] The present invention provides a trench-type insulated gate bipolar transistor capable of double-terminal control, such as figure 2 As shown, including an N-Sub type substrate 19, a first groove and a second groove are respectively etched in the middle of the upper and lower surfaces of the N-Sub type substrate 19, and the first groove and the second groove are respectively provided with First SiO 2 Gate oxide layer 9 and the second SiO 2 Gate oxide layer 20, the first SiO 2 Gate oxide layer 9 and the second SiO 2 A first polysilicon gate 10 and a second polysilicon gate 21 are respectively deposited on the gate oxide layer 20, and the outer surfaces of the first polysilicon gate 10 and the second polysilicon gate 21 are respectively provided with a first electrode 1 and the second electrode 8, the first SiO 2 A first P+ well 4 i...
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