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Method for preparing metal pattern on curved surface by combining nano-imprinting with wet etching

A technology of wet etching and nano-imprinting, which is applied in the coating process of metal materials, the photoplate making process of the patterned surface, and the process for producing decorative surface effects. unbreakable effect

Active Publication Date: 2014-03-26
WUXI IMPRINT NANO TECH
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AI Technical Summary

Problems solved by technology

The lift-off process needs to obtain a uniform lift-off layer, and it is impossible to use the spin-coating process to obtain a uniform film on the curved surface; while using a soft template for curved surface imprinting, only UV-curable imprinting glue can be used for embossing, and After the imprinting glue is cured under ultraviolet light, a cross-linked network is formed, so that it can no longer be dissolved in organic solvents, and cannot be lifted.

Method used

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  • Method for preparing metal pattern on curved surface by combining nano-imprinting with wet etching

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Embodiment Construction

[0018] The method will be further described below in conjunction with the accompanying drawings.

[0019] The present invention proposes a novel metal pattern preparation method, which uses metal vapor deposition to evenly coat a layer of metal film on the curved surface, and then prepares a polymer on the metal film by double transfer embossing method on the curved surface. Afterwards, the residual layer is removed by reactive ion etching to expose the substrate, and the remaining polymer is used as a mask for wet etching to etch the underlying metal film to form the desired pattern. The specific operation steps are as follows:

[0020] (1) Evaporation of metal on the curved surface

[0021] First, a layer of metal is plated on the curved surface, and the metal can be gold, silver, copper, aluminum, or chromium. The method of electron beam evaporation can be adopted, and the method of magnetron sputtering can also be adopted, and the thickness of the evaporated metal is 1-1...

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Abstract

The invention discloses a method for preparing a metal pattern on a curved surface by combining nano-imprinting with wet etching. The method comprises the following steps: firstly, evaporating one layer of metal on the curved surface; then imprinting a pattern on the metal by a transferring method; etching to remove a residual layer by a reaction ion etching method; etching the metal to a base by taking imprinting glue as a mask; and then removing the imprinting glue on the upper layer of the metal pattern by using the reaction ion etching to obtain the metal pattern. The method disclosed by the invention is simple and feasible; an ion lifting process is replaced on a plane to prepare the metal pattern; compared with a common ion lifting process, the integrity of the pattern is not easy to damage and the defects are reduced; the metal pattern is prepared on the curved surface and the process of preparing the pattern on the curved surface cannot be realized by the ion lifting process. The method has a wide application prospect in the fields of production of a fiber Bragg grating, a refraction / diffraction mixed optical element, a nano electromechanical system and the like.

Description

technical field [0001] The invention relates to a method for preparing a metal pattern on a curved surface by using nanoimprint technology combined with wet etching. Background technique [0002] Recently, the preparation of nanostructures on curved and complex surfaces has attracted more and more attention, especially in the fields of artificial compound eyes, hemispherical electronic eye cameras, photovoltaic devices, image sensor arrays, micro actuators and fiber optic sensors. widely. In 1995, since Steven Y. Chou and others invented nanoimprint technology, nanoimprint technology has attracted many researchers and engineers in the field of microstructure production due to its advantages of high efficiency, high resolution and low cost. focus on. Although many micro-nanofabrication techniques can fabricate patterned nanostructures on planar substrate surfaces, most of these techniques are not suitable for fabricating nanopatterns on non-planar substrate surfaces. There...

Claims

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Application Information

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IPC IPC(8): G03F7/00B81C1/00
Inventor 胡昕葛海雄袁长胜陈延峰
Owner WUXI IMPRINT NANO TECH
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