Silver target manufacturing method

Abstract

The invention relates to the field of target manufacturing and particularly relates to a silver target manufacturing method. The silver target manufacturing method comprises the following steps: selecting a silver raw material with purity of over 4N, fusing the silver raw material by utilizing the atmosphere smelting or vacuum smelting method, casting the melt and then cooling to form an ingot blank; immediately carrying out thermal insulation heat treatment on the ingot blank, i.e., carrying out thermal insulation homogenization within the temperature range of 400 to 900 DEG C and then carrying out hot rolling or forging by an air hammer to form a silver blank, wherein the thermal insulation time is over 0.5h; carrying out cold rolling on the silver blank to form a cold-rolled blank; and carrying out annealing heat treatment on the cold-rolled blank for 0.5 to 3 hours at the annealing heat treatment temperature of 350 to 700 DEG C to obtain a silver target blank with fine and uniform crystal grains and finally, machining by a machine tool to obtain a large-size silver target. The process is higher in machining efficiency and can produce the lower-cost large-size silver target with high quality.

Description

technical field [0001] The invention relates to the field of target material manufacturing, in particular to a silver target material manufacturing method. Background technique [0002] Physical vapor deposition (PVD, Physical Vapor Deposition) is widely used in high-end manufacturing industries such as optics, electronics, and information. The target used in PVD is the most important raw material in the manufacturing process of liquid crystal displays, solar cells, and integrated circuits. one. [0003] Because metallic silver has excellent properties such as low resistance and high reflectivity, it is widely used in the production of thin layers of electrodes or reflective layers. For example, in optical recording media, solar cells, low-emissivity glass, liquid crystal displays and other products, silver thin layers are mostly The silver target is used as the raw material, and it is formed by sputtering coating. [0004] Silver targets for industrial applications need t...

AI Technical Summary

Problems solved by technology

Generally speaking, splicing of multiple pieces of targets is commonly used in the industry to use large-size targets, but the more pieces are spliced, the more splicing gaps will be, which will affect the uniformity of the plasma during the coating process and may cause local irregularities. Normal discharge will reduce the quality and yield of the coating product. In addition, the more splicing quantity, the more difficult the quality consistency between the pieces is, which will eventually reduce the uniformity of the film layer and product quality.

[0009] For example, when low-emissivity glass is coated, the total length of the target can reach 3750mm, and the size of the spliced ​​single piece can reach 600mm, and there is a tendency to gradually increase the maximum length of the single piece; in the thin film solar cell industry, the length of the common coating target is 1410mm, It is generally a three-piece splicing method with thick ends and thin middle, and the splicing length of the single piece in the middle is nearly 1000mm; the small-sized round silver target used in the traditional optical disc industry is produced by forging, but due to the large investment and high cost of forging equipment , and limited by the size of the forging die, the size of the manufactured target is small and difficult to enlarge; therefore, the forging production method of the small-size silver target originally used in the optical disc industry has been difficult to meet the current production needs of large-size products

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