Double mercury lamp splicing exposure system for lithography equipment

Abstract

The invention discloses a double-mercury lamp spliced exposure system for lithography equipment. The double-mercury lamp spliced exposure system comprises a first light source and a second light source used for simultaneously or respectively providing illuminating beams; a first dodging component and a second dodging component which respectively correspond to the first light source and the second light source, a coupling lens group used for improving the illumination uniformity of the exposure system, and an illuminating and dodging component used for dodging emergent light of the coupling lens group to illuminate an illumination surface.

Description

technical field [0001] The invention relates to the field of integrated circuit equipment manufacturing, in particular to a double mercury lamp splicing exposure system for photolithography equipment. Background technique [0002] The photolithography device is the main equipment for manufacturing integrated circuits. Its function is to sequentially image different mask patterns onto the precisely aligned positions on the substrate (such as semiconductor silicon wafer or LCD panel). However, this alignment position changes due to the physical and chemical changes experienced by successive patterns, so an alignment system is needed to ensure that the alignment position of the silicon wafer corresponding to the mask can be accurately aligned every time. As the number of electronic components per unit surface area of ​​the substrate increases and the size of electronic components becomes smaller and smaller, the precision requirements for integrated circuits are increasing. The...

AI Technical Summary

Problems solved by technology

[0006] In view of this, there is a need for a new dual-light source lighting technology in the prior art, which can effectively overcome the shortcomings of low lighting accuracy and difficult control in the prior art.

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