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A method for measuring the passing rate of an electron beam in a microwave vacuum device

An electronic device and microwave vacuum technology is applied in the field of electron injection pass rate measurement in microwave vacuum electronic devices. performance, improve system accuracy, and reduce complexity

Active Publication Date: 2013-10-23
INST OF ELECTRONICS CHINESE ACAD OF SCI
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Problems solved by technology

In addition, the essence of this method is to count the electron beam passing rate based on the number of electrons, not the electron beam energy passing rate. When the electron beam emits secondary electrons in the tube, a certain error will occur.
[0006] In the second method, although the temperature measurement method can avoid the use of insulating ceramics, in the thermal measurement or working process of the vacuum tube, the vacuum tube is used as a whole device, and the heat generated at the tube body, collector and even the electron gun will interact with each other. Conduction and radiation to the surrounding space, which may affect the temperature distribution of various parts of the vacuum tube, cause measurement errors, and limit the application and accuracy of temperature measurement methods

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  • A method for measuring the passing rate of an electron beam in a microwave vacuum device
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  • A method for measuring the passing rate of an electron beam in a microwave vacuum device

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[0023] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0024] The invention discloses a method for measuring the electron injection pass rate of a microwave vacuum electronic device. The method calculates and obtains the electronic injection rate of the device by measuring the heat change of the cooling water of the tube body of the electric vacuum device, the electron injection voltage waveform and the electron injection total current. The electron beam passing rate effectively improves the accuracy of the electron beam passing rate measurement and reduces the process complexity of microwave vacuum electronic devices.

[0025] In an exemplary embodiment of the present invention, a method for measuring electron injection throughput of a microwave vacuum electronic device is pr...

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Abstract

The invention discloses a method for measuring the passing rate of an electron beam in a microwave vacuum device. The electron beam passing rate of the device is acquired by measuring the heat change of tube body cooling water of an electric vacuum device, the voltage waveforms of the electron beam, and the total current of the electron beam. The method is easy to execute and eliminates various measuring errors with means such as an external power calibration system or the like, achieving high accuracy. By using the method, ceramic material with low mechanical strength is prevented from being used in a component at the collector of the device. Therefore, tube manufacturing difficulty is decreased and yield is increased.

Description

technical field [0001] The invention relates to the technical field of electric vacuum devices in the electronics industry, in particular to a method for measuring electron injection throughput in microwave vacuum electronic devices. Background technique [0002] Electrovacuum devices are a type of active electronic devices that use electron beams to interact with high-frequency electromagnetic fields to achieve microwave power amplification and conversion functions in vacuum or gaseous media. The main types of microwave vacuum electronic devices include: klystrons, traveling wave tubes, magnetrons, gyrotrons, and orthogonal field amplifiers, etc., which are widely used in radar, accelerator, remote sensing, communication, navigation, radio and television systems High power emission source. [0003] In microwave vacuum electronic devices, in order to ensure sufficient interaction between the electron beam and the high-frequency field, it is usually required that the electro...

Claims

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Application Information

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IPC IPC(8): G01R31/25
Inventor 范俊杰朱方范旭东
Owner INST OF ELECTRONICS CHINESE ACAD OF SCI
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