Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Annealing apparatus and annealing process

An annealing device and annealing process technology, applied in ohmic resistance heating devices, electrical components, semiconductor/solid-state device manufacturing, etc., can solve the problems of long annealing time, large damage to the substrate, single function of the annealing device, etc., and achieve the goal of improving annealing efficiency Effect

Active Publication Date: 2013-10-02
BOE TECH GRP CO LTD +1
View PDF3 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The traditional annealing device generally has a single function, and the annealing time is relatively long; the traditional annealing device uses heating wires or halogen lamps to heat, which causes relatively large damage to the substrate

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Annealing apparatus and annealing process
  • Annealing apparatus and annealing process
  • Annealing apparatus and annealing process

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0033] The structure and principle of the present invention will be described in detail below in conjunction with the accompanying drawings, and the examples given are only used to explain the present invention, not to limit the protection scope of the present invention.

[0034] Such as figure 1 , image 3 As shown, the present embodiment provides an annealing device, comprising:

[0035] A temperature gradient preheating unit 100, configured to perform gradient preheating on the substrate 600 to be annealed with gradient temperatures;

[0036] The high temperature unit 300 is used to heat the preheated substrate 600 at high temperature;

[0037] The moving device is used for transporting the substrate 600 from the temperature gradient preheating unit 100 to the high temperature unit 300 when the substrate 600 undergoes gradient preheating and / or after preheating.

[0038] The substrate 600 is preheated by gradient heating, which improves the annealing efficiency.

[0039...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to an annealing apparatus and an annealing process. The annealing apparatus comprises a temperature gradient preheating unit which is used for performing gradient heating on a to-be-annealed substrate by using gradient temperatures, a high temperature unit which is used for performing high-temperature heating on the preheated substrate, a moving apparatus which is used for transporting the substrate to the high temperature unit from the temperature gradient preheating unit during the gradient preheating of the substrate and / or after the preheating of the substrate. The beneficial effects of the annealing apparatus and the annealing process are that since the method of gradient heating is adopted and preheating processing is conducted on the substrate, the annealing efficiency is improved; since a plasma induction unit and the electromagnetic field auxiliary high temperature unit are added, multiple functions are integrated and the annealing efficiency is further improved.

Description

technical field [0001] The invention relates to the technical field of liquid crystal display, in particular to an annealing device and an annealing process. Background technique [0002] Flat panel display technology makes our life rich and colorful. With the improvement of people's living standards, people's requirements for display quality are getting higher and higher. Liquid crystal display (LCD) technology has been very mature. Its products include mobile phones, cameras, monitors, flat panels Computers, TVs, outdoor displays, etc. People's large demand for display products objectively promotes the development of display technology, and new display technologies emerge in endlessly. The active layer of the thin film transistor (Thin Film Transistor, TFT) of the traditional liquid crystal display is made of amorphous silicon (a-Si) material, because the amorphous silicon itself has certain problems, such as the low on-state current and the mobility caused by too many de...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/324
CPCH05B3/0047H01L21/324H01L21/67115H01L21/6776
Inventor 王祖强
Owner BOE TECH GRP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com