Preparation method for large area surface-enhanced Raman active substrate by inclination growth

Abstract

The invention relates to a preparation method for a large area surface-enhanced Raman active substrate by inclination growth. The preparation process comprises a first step of taking one substrate; a second step of washing the substrate with a physical and chemical method; a third step of obliquely placing the washed substrate in a growth chamber; and a fourth step of growing a metal nano structure on the substrate by a vapor deposition method to finish the preparation. The surface-enhanced Raman active substrate prepared by the method has the advantages of large area, simple process, a controllable structure, low cost and high reliability.

Description

technical field [0001] The invention belongs to the fields of Raman spectrum analysis and detection technologies such as biosensing, electrochemical monitoring, and environmental analysis, and nanomaterials, and specifically relates to a preparation method for oblique growth of large-area surface-enhanced Raman active substrates. Background technique [0002] Raman spectroscopy is a spectral molecular detection method, which can identify substances and determine its chemical composition and relative content, and has broad application prospects in the field of sensing and detection. This spectral analysis method is based on the Raman scattering effect. By analyzing the scattering spectrum with a different frequency from the incident light, the molecular vibration and rotation information can be obtained, and then applied to the study of molecular structure. In organic chemistry, Raman spectroscopy can be used as a means of structural identification. The size, intensity and Ra...

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Problems solved by technology

For the electrochemical redox method and the metal sol method, the substrates prepared generally have problems such as poor repeatability, low stability and complicated preparation process.

Focused ion beam etching and electron beam etching techniques have high etching resolution and pattern making freedom, so metal nanostructure substrates with good repeatability and high stability can be obtained, but these methods are costly, complicated, and The area of ​​the prepared substrate is small and the speed is slow, which cannot realize industrialized mass production

Nanoimprint technology can avoid the above problems, but it needs to make nanostructure imprint templates through fine micro-nano processing technology, and it is not convenient to randomly adjust the structural parameters of fine patterns

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