Method for preparing three-dimensional hollow micro nanometer functional structure by utilizing laser direct writing

Abstract

Te invention discloses a method for preparing a three-dimensional hollow micro nanometer functional structure by utilizing laser direct writing. The method is used for obtaining a three-dimensional micro nanometer functional structure through surface functionalization. The method comprises the following steps of: selecting and processing a hollow substrate, and placing a hollow substrate on an object carrying support foundation base; titrating a photoresist on the object carrying support foundation base of the hollow substrate, and preparing a laser direct writing photoresist polymeric compound three-dimensional hollow micro nanometer structure; and carrying out surface functionalization of the photoresist polymeric compound three-dimensional hollow micro nanometer structure, carrying out ornament and treatment on the three-dimensional hollow micro nanometer functional structure, thereby obtaining a finished product. The method provided by the invention can be used for preparing photoresist polymeric compound hollow three-dimensional micro nanometer structures with different heights, side lengths and cross-section geometrys on the hollow substrate based on a two-photon polymerization, and then the functionalization of the photoresist polymeric compound hollow three-dimensional micro nanometer structure is realized through growth and ornament treatment of a functionalization material, and the method has the characteristics of complex picture batch, reiteration design and controllable preparation of any complex picture.

Description

technical field [0001] The invention relates to the field of three-dimensional optoelectronic structures and devices, in particular to a three-dimensional micro-nano structure of photoresist polymer prepared on a hollow substrate based on three-dimensional laser direct writing, and then used as a matrix to grow metal, semiconductor or dielectric films A method for functionalizing a three-dimensional micro-nano structure of a polymer. Background technique [0002] Three-dimensional micro-nano functional structures have important applications in many fields, especially in the field of new three-dimensional optoelectronic structures and devices. For example, the pyramidal metal surface structure can be used to effectively generate or modulate surface plasmons, and realize localization beyond the diffraction limit. focus. The surface plasmon is an electromagnetic mode formed by the interaction between free electrons and photons in the metal surface area. In the functionalized p...

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Problems solved by technology

[0004] The purpose of the present invention is to provide a method for preparing three-dimensional hollow micro-nano functional structures by laser direct writing, using a method based on two-photon polymerization to prepare photoresists with various heights, side lengths and cross-sectional geometries on hollow substrates The polymer hollow three-dimensional micro-nano structure, through the growth of functional materials, realizes the functionalization of the photoresist polymer hollow three-dimensional micro-nano structure, overcomes the shortcomings of the previous preparation methods, which are complicated, inefficient, and unable to freely design, and realizes a variety of hollow linings. Batch, repeatable, designable, and controllable preparation of three-dimensional hollow micro-nano functional structures on the bottom to meet the needs of new optoelectronics and sensing fields

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