Method for manufacturing low layer number graphene film on silicon carbide substrate
A silicon carbide substrate, graphene film technology, applied in the direction of graphene, nano-carbon, etc., to achieve the effect of inhibiting sublimation and stable and controllable effective carbonization time
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[0025] The provided method for growing a low-layer graphene film on a high-purity semi-insulating silicon carbide substrate with a positive crystal orientation (0001) silicon surface comprises the following steps:
[0026] 1) Select a high-purity semi-insulating silicon carbide substrate with a positive crystal orientation (0001) silicon surface, and place the substrate on a graphite base coated with tantalum carbide;
[0027] 2) The temperature of the system is raised to 1570°C, the pressure of the reaction chamber is set to 100mbar, and the surface of the substrate is treated online under the atmosphere of hydrogen flow rate of 80L / min and argon flow rate of 3L / min to remove surface damage and form micro steps, the processing time is 30 minutes;
[0028] 3) Reduce the temperature of the reaction chamber to 1200°C, and gradually reduce the flow of hydrogen from 80L / min to 0L / min, keep the flow of argon at 3L / min, set the pressure of the reaction chamber to 100mbar, and the pr...
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