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Method for enhancing chemical etching through femtosecond laser to manufacture large-scale micro-lens array

A technology of microlens array and femtosecond laser, applied in laser welding equipment, optics, lenses, etc., can solve the problems of low production efficiency, uncontrollable shape, high cost, etc., and achieve the effect of efficient processing technology

Active Publication Date: 2012-11-21
XI AN JIAOTONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the limitation of the current level of raw processing technology, the preparation of large-scale 3D microlens arrays with controllable morphology is a technical problem that needs to be solved urgently.
Traditional micromachining techniques such as photolithography, reflow, diamond turning, and laser direct writing still have problems such as low production efficiency, high cost, and uncontrollable morphology.

Method used

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  • Method for enhancing chemical etching through femtosecond laser to manufacture large-scale micro-lens array
  • Method for enhancing chemical etching through femtosecond laser to manufacture large-scale micro-lens array
  • Method for enhancing chemical etching through femtosecond laser to manufacture large-scale micro-lens array

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Embodiment 1

[0026] A method for preparing a large-scale microlens array by using femtosecond laser enhanced chemical etching, comprising the following steps:

[0027] Step 1. Select the hard material used as the femtosecond laser target, put it into three solutions of acetone, ethanol, and deionized water in order to clean thoroughly, then place the target on the femtosecond laser micro-nano processing device, and select the pulse An ultrashort pulse laser with a width of 30fs and a wavelength of 800nm ​​is focused on the surface of a hard material through an objective lens with a numerical aperture of 0.5;

[0028] Step 2. According to the shape of the rectangular microlens array to be processed, control the speed at which the precision machining platform moves the target. The femtosecond laser acts on the surface of the target for 500 pulses. Due to the special processing characteristics of the femtosecond laser, on the target A photodestructive zone is generated centered on the focus o...

Embodiment 2

[0034] A method for preparing a large-scale microlens array by using femtosecond laser enhanced chemical etching, comprising the following steps:

[0035] Step 1. Select the hard material used as the femtosecond laser target, put it into three solutions of acetone, ethanol, and deionized water in order to clean thoroughly, then place the target on the femtosecond laser micro-nano processing device, and select the pulse An ultrashort pulse laser with a width of 30fs and a wavelength of 800nm ​​is focused on the surface of a hard material through an objective lens with a numerical aperture of 0.5;

[0036] Step 2. According to the shape of the rectangular microlens array to be processed, control the speed at which the precision machining platform moves the target. The femtosecond laser acts on the surface of the target for 500 pulses. Due to the special processing characteristics of the femtosecond laser, on the target A photodestructive zone is generated centered on the focus o...

Embodiment 3

[0042] A method for preparing a large-scale microlens array by using femtosecond laser enhanced chemical etching, comprising the following steps:

[0043] Step 1. Select the hard material used as the femtosecond laser target, put it into three solutions of acetone, ethanol, and deionized water in order to clean thoroughly, then place the target on the femtosecond laser micro-nano processing device, and select the pulse An ultrashort pulse laser with a width of 30fs and a wavelength of 800nm ​​is focused on the surface of a hard material through an objective lens with a numerical aperture of 0.5;

[0044]Step 2. According to the shape of the rectangular microlens array to be processed, control the speed at which the precision machining platform moves the target. The femtosecond laser acts on the surface of the target for 1000 pulses. Due to the special processing characteristics of the femtosecond laser, on the target A photo-destructive zone is generated centered on the focus ...

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Abstract

Provided is a method for enhancing chemical etching through femtosecond laser to manufacture a large-scale micro-lens array. The method includes: choosing hard materials serving as femtosecond laser action targets, and generating a light destroying area at the center of the target with the femtosecond laser acting focus as the center due to the special machining characteristics of the femtosecond laser according to the shape of a micro-lens array needing machining by controlling the target moving speed of a precise machining platform and enabling the femtosecond laser to act for 100-1000 pulse counts on the surface of the target, wherein the impulse frequency is 1KHz; performing chemical corrosion on the target processed by the femtosecond laser through hydrofluoric acid solution with the volume concentration of 1% to 10%, wherein the chemical corrosion is assisted by ultrasonic wave water bath heating, the heating temperature is 30-80 DEG C, and the heating time is 40-80 minutes; and thoroughly cleaning the corroded target in deionized water, therefore a template finished product of the large-scale micro-lens array is obtained. The method for enhancing chemical etching through femtosecond laser to manufacture the large-scale micro-lens array combines the chemical etching technology and finally achieves low-cost and high-efficiency volume production of the large-scale micro-lens array.

Description

technical field [0001] The invention belongs to the field of femtosecond laser micro-nano processing optical devices, in particular to a method for preparing a large-scale microlens array by using femtosecond laser-enhanced chemical etching, and performing a large-scale shape-controllable microlens array on the surface of a hard material preparation. Background technique [0002] Microlens arrays have extremely important application values ​​in the fields of integrated optoelectronics, optical communications, optical sensing, micro-electromechanical systems, new display and lighting technologies, and biomedicine. However, due to the limitation of the current raw processing technology level, the preparation of large-scale three-dimensional microlens arrays with controllable morphology is a technical problem that needs to be solved urgently. Traditional micromachining techniques such as photolithography, reflow, diamond turning, and laser direct writing still have problems su...

Claims

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Application Information

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IPC IPC(8): B23K26/00G02B3/00B23K26/36
Inventor 陈烽杨青胡洋王先华瞿谱波刘贺炜司金海侯洵
Owner XI AN JIAOTONG UNIV
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