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Method for cleaning boron-diffusion furnace tubes

A furnace tube and diffusion source technology, applied in the field of solar cell preparation, can solve problems such as damage to quartz devices, affecting diffusion effects, etc., and achieve the effects of prolonging life, improving diffusion quality, and simple and practical technical solutions

Active Publication Date: 2014-12-10
YINGLI ENERGY CHINA
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The present invention aims to provide a method for cleaning the furnace tube for boron diffusion, so as to solve the technical problem that the by-product BSG produced in the boron diffusion process of solar cells in the prior art will affect the diffusion effect and cause damage to quartz devices

Method used

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Effect test

Embodiment approach

[0018] According to a typical implementation of the present invention, the method for cleaning the furnace tube for boron diffusion includes the following steps: 1) Introducing nitrogen gas and source nitrogen gas into the furnace tube for boron diffusion at a volume ratio of 75:1 to 1:1, and continuously More than 30 minutes, wherein, the source nitrogen carries pure water vapor; 2) Stop feeding nitrogen and source nitrogen to complete the cleaning. By applying the technical solution of the invention, the furnace tube is cleaned by using pure water vapor without changing the structure of the furnace tube. Because BSG (borosilicate glass) is very soluble in water, it is easy to clean the furnace tube with pure water vapor, and the waste generated during the cleaning process can be discharged through the trachea. In a word, the technical solution of the present invention is simple and practical, without changing the equipment structure, the purpose of cleaning the furnace tube,...

Embodiment 1

[0024] 1) Raise the temperature inside the furnace tube to 860°C, and feed nitrogen gas and source nitrogen gas into the furnace tube for boron diffusion at a volume ratio of 75:1 for more than 30 minutes, wherein the source nitrogen gas carries pure water vapor, Control the water temperature in the pure water source bottle at 15°C; the flow rate of nitrogen carrying pure water vapor is 0.2slm;

[0025] 2) Stop feeding nitrogen and carrying source nitrogen into the furnace tube, and lower the temperature inside the furnace tube to 750°C.

Embodiment 2

[0027] 1) Raise the temperature in the furnace tube to 960°C, and feed nitrogen gas and source nitrogen gas into the furnace tube for boron diffusion at a volume ratio of 1:1 for more than 30 minutes. Among them, the source nitrogen gas carries pure water vapor, Control the water temperature in the pure water source bottle at 30°C; the flow rate of nitrogen carrying pure water vapor is 5slm;

[0028] 2) Stop feeding nitrogen and carrying source nitrogen into the furnace tube, and lower the temperature inside the furnace tube to 850°C.

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Abstract

The invention discloses a method for cleaning boron-diffusion furnace tubes. The method includes steps of 1), continuously feeding nitrogen and source carrying nitrogen into a boron-diffusion furnace tube for longer than 30 minutes; and 2), stopping feeding of the nitrogen and the source carrying nitrogen and completing cleaning. The source carrying nitrogen contains pure steam. According to the technical scheme, the pure steam cleans the furnace tube under the condition that the structure of the furnace tube is not changed. As BSG (boron silicate glass) is quite easy to dissolve in water, the pure steam can easily clean the furnace tube, and waste generated in a cleaning process can be discharged along an exhaust tube. In conclusion, the method in the technical scheme is simple and practical, and purposes of cleaning the furnace tube, improving diffusion quality and prolonging the service life of a quartz device can be achieved without changing the structure of equipment.

Description

technical field [0001] The invention relates to the technical field of solar cell preparation, in particular to a method for cleaning a furnace tube for boron diffusion. Background technique [0002] A solar cell is a device that directly converts light energy into electrical energy through the photoelectric effect. The main process of a conventional solar cell is texturing, diffusion, wet etching, deposition of an anti-reflection film, screen printing, and sintering. Due to the different doping of the base substrate, it is divided into P-type solar cells and N-type solar cells. A solar cell made of an N-type semiconductor silicon wafer (substrate) is called an N-type solar cell. To form a PN junction, the diffusion source usually uses boron in boron tribromide (liquid state) to diffuse into the silicon wafer to form a P-type semiconductor. [0003] During the solar cell boron diffusion (boron tribromide liquid source tubular diffusion) process, a by-product BSG (borosilica...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B9/027
Inventor 崔景光刘旭寇继成王海亮
Owner YINGLI ENERGY CHINA
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