Wavefront measuring method based on Hartmann wavefront sensor

Abstract

The invention relates to a wavefront measuring method based on a Hartmann wavefront sensor. According to the method, light spot array images detected by an array type photoelectric detector in the Hartmann wavefront sensor are used for obtaining the intensity distribution information of each light spot and the mass center position offset relative to the calibration time, the inclination aberration information of a sub wavefront in the corresponding sub aperture can be obtained according to the mass center offset, the high order aberration information of defocusing, astigmatism and the like ofthe sub wavefront in the corresponding sub aperture can be obtained by a phase inversion algorithm according to the intensity distribution information of the light spot, the inclination aberration information and the high order aberration information are combined to form sub wavefronts, and finally, all sub wavefronts are reconstructed by a wavefront reconstruction method or a wave surface split joint method for forming the whole aperture wavefront information. The method has the advantages that the light spot dispersion distribution information which originally puzzles the light spot mass center calculation is utilized, more information quantity of the sub wavefronts in the sub aperture is obtained, the wavefront detection precision of the Hartmann wavefront sensor is favorably improved,or the requirement on the aperture number is favorably reduced.

Description

technical field [0001] The invention belongs to the technical field of optical information measurement, and relates to a method for measuring the wavefront of an incident light beam, in particular to a novel wavefront measurement method based on a Hartmann wavefront sensor. Background technique [0002] In adaptive optics, optical detection, photoelectric detection and other applications, it is necessary to measure the wavefront of the beam. Especially in adaptive optics systems, wavefront detection is an important prerequisite for adaptive control, which requires fast measurement of wavefront information for real-time wavefront control and correction. At present, many measurement methods have been applied in practice, such as shear interference wavefront sensing technology, Hartmann wavefront sensing technology, curvature wavefront sensing technology and phase inversion method, etc. These methods have their own advantages and disadvantages, and are used in various applicat...

AI Technical Summary

Problems solved by technology

The above-mentioned methods for improving the measurement accuracy of the Hartmann wavefront sensor regard the wavefront in each sub-aperture as a first-order plane containing only oblique aberrations. This premise limits the space for further improvement of the accuracy of the Hartmann wavefront sensor. Its application in high precision measurement

[0004] Shane Barwick proposed using an astigmatic hybrid wavefront sensor to simultaneously measure the first-order slope and quadratic curvature of the sub-aperture wavefront, see "Detecting higher-order wavefront errors with an astigmatic hybrid wavefront sensor" [Shane Barwick.[J]. OPTICS LETTERS, 2009, 34(11)], this method requires each lens in the microlens to retain a certain amount of astigmatic aberration, and a four-quadrant detector array is used to detect the spot array, the manufacturing process is complicated and difficult to realize, which limits promotion and practical application

Images