Optical element X, Y and theta Z three-freedom-degree jogging regulation device

Abstract

The invention discloses an optical element X, Y and theta Z three-freedom-degree jogging regulation device belonging to the field of structural design and aberration compensation of a photoetching object lens. In order to solve the problem of X, Y and theta Z three-freedom-degree high precision regulation of an optical element, the invention provides an optical element flexible jogging regulation device based on a 3-RRR plane mechanism. The optical element X, Y and theta Z three-freedom-degree jogging regulation device comprises an optical frame, three drivers and two capacitor sensors, wherein the three drivers and the two capacitor sensors are respectively fixed on the optical frame, the optical frame is of an integrated structure and comprises an optical frame inner ring, an optical frame outer ring and three movement branch chains, each movement branch chair comprises three flexible hinges, a connecting rod and a second connecting rod, the outer side of each movement branch chain is connected with the optical frame outer ring, the inner side of each movement branch chain is connected with the optical frame inner ring, and the three movement branch chains are respectively uniformly arranged at intervals of 120 DEG along the circumferential direction. The optical element X, Y and theta Z three-freedom-degree jogging regulation device is suitable for the jogging regulation of the optical lens in a deep ultraviolet projection objective.

Description

technical field [0001] Optical elements X, Y, θ Z A three-degree-of-freedom micro-adjustment device belongs to the field of structure design and aberration compensation of photolithography objective lenses, and is especially suitable for micro-adjustment of optical lenses in deep ultraviolet projection objectives. Background technique [0002] Projection lithography equipment is the key equipment in the manufacturing process of large-scale integrated circuits. In recent years, with the continuous improvement of the fineness of the line width of integrated circuits, the resolution of projection optical equipment has gradually improved. At present, the ArF excimer laser with a wavelength of 193.368nm Lithography equipment has become the mainstream equipment for integrated circuit manufacturing at 90nm, 65nm and 45nm nodes. [0003] During the installation, adjustment and use of the projection lithography objective lens, in order to meet the good optical performance of the obj...

AI Technical Summary

Problems solved by technology

[0004] The present invention is to solve lithography projection objective lens optical element X, Y, θ Z Three-degree-of-freedom high-precision adjustment problem, proposed optical elements X, Y, θ Z Three-degree-of-freedom micro-adjustment device, especially suitable for micro-adjustment of the optical lens in the deep ultraviolet projection objective lens

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