Cadmium telluride thin-film solar cell back contact layer production method and vertical coater

Abstract

The invention discloses a cadmium telluride thin-film solar cell back contact layer production method, and the production process is carried out in the vacuum environment. The steps are as follows: a substrate is preheated to 160 DEG C to 220 DEG C; after the substrate is heated to 230 DEG C to 320 DEG C, the magnetron sputtering of antimony telluride is carried out; after the substrate is cooled to 80 DEG C to 120 DEG C, the sputtering of nickel-vanadium alloy is carried out; and the substrate is cooled to less than 70 DEG C and then discharged. The coating of a cadmium telluride thin-film solar cell back contact layer produced by the method is uniform, and the number of pinholes is less. The invention also discloses a vertical coater which adopts the method to produce cadmium telluride thin-film solar cell back contact layers, the vertical coater comprises but is not limited to a preheating chamber, a temperature-keeping antimony telluride deposition chamber, a nickel-vanadium alloy deposition chamber, a temperature-decreasing discharge chamber, a vacuum system and the like which are connected in series through vacuum valves, and the vertical coater can simultaneously coat both sides of the substrate, enlarge the effective region of the coating and increase the production efficiency, and is easy to overhaul.

Description

technical field [0001] The invention belongs to the field of cadmium telluride thin-film solar cell manufacturing, and is specifically applied to manufacturing the back contact layer part of the cadmium telluride thin-film solar cell by adopting a magnetron sputtering coating process. Background technique [0002] Nowadays, cadmium telluride thin-film solar cells are more and more valued by investors or users due to their advantages of high cost performance, simple process, and low energy consumption. In the manufacturing process of cadmium telluride thin-film solar cells, the background The preparation of the contact layer is one of the key processes. At present, the commonly used coating processes mainly include screen printing, high vacuum evaporation and ion beam evaporation. Among them, although the screen printing method requires relatively simple equipment, it is only for silver. In terms of the processing of materials such as slurry and graphite slurry, and these mat...

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Problems solved by technology

[0002] Nowadays, cadmium telluride thin-film solar cells are more and more valued by investors or users due to their advantages of high cost performance, simple process, and low energy consumption. In the manufacturing process of cadmium telluride thin-film solar cells, the background The preparation of the contact layer is one of the key processes. At present, the commonly used coating processes mainly include screen printing, high vacuum evaporation and ion beam evaporation. Among them, although the screen printing method requires relatively simple equipment, it is only for silver. In terms of the processing of materials such as slurry and graphite slurry, and these materials have disadvantages such as high cost, high transportation cost and strict storage conditions, they are not suitable for large-scale industrial production; and the material utilization rate of high vacuum evaporation method It is not high, and it is not easy to control the consumption of materials during the coating process, nor can it adapt to the coating requirements of large-area panels, and the coating efficiency is low; the ion beam evaporation method has higher requirements for manufacturing equipment, and for large-scale or For large-area panels, it is difficult to meet the requirements of uniform coating and cannot be applied to large-scale industrial production

[0003] Furthermore, the traditional coating device adopts the principle of up-and-down coating, which easily causes the dust on the upper side to fall to the substrate below during the coating process, resulting in pinhole phenomenon, and it is not enough to repair or replace the target. It is convenient, and the upper and lower coatings on the edge of the substrate are the traditional device support area, and the coating in this support area needs to be removed. Therefore, the effective range of the coating is low and the production cost is high

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