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Element performance prediction method and element structure optimization method

A performance prediction and device technology, which is applied in semiconductor/solid-state device testing/measurement, instruments, electrical components, etc., can solve problems such as the difficulty of effectively judging the pros and cons of a design, the establishment of an analytical function relationship, and the difficulty of knowing the performance of a semiconductor device in advance

Active Publication Date: 2012-07-18
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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Problems solved by technology

However, it is practically difficult to establish an analytical functional relationship between these parameters and device performance
Therefore, when designing a semiconductor device, for specific design parameters, it is difficult to know in advance the performance of the semiconductor device manufactured according to this design, and therefore it is difficult to effectively determine the pros and cons of the design

Method used

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  • Element performance prediction method and element structure optimization method
  • Element performance prediction method and element structure optimization method
  • Element performance prediction method and element structure optimization method

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Embodiment Construction

[0026] Hereinafter, the present invention is described by means of specific embodiments shown in the drawings. It should be understood, however, that these descriptions are exemplary only and are not intended to limit the scope of the present invention. Also, in the following description, descriptions of well-known structures and techniques are omitted to avoid unnecessarily obscuring the concept of the present invention.

[0027] figure 1 A schematic flowchart of a device performance prediction method according to an embodiment of the present invention is shown.

[0028] Such as figure 1 As shown, the device performance prediction method 100 according to this embodiment starts from step 101, in which step, the structural parameters and / or process parameter sets of the device are input. Such a parameter set is, for example, a parameter set selected during design, and may include gate length, threshold voltage, parasitic resistance and / or gate dielectric thickness and other ...

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Abstract

The invention discloses an element performance prediction method and an element structure optimization method. According to the embodiment of the invention, structural parameters and / or technique parameters of a semiconductor element form parameter points in a parameter space, a behavior model base is created for a plurality of discrete preset parameter points in the parameter space, and the behavior model base correlates the preset parameter points with corresponding element performance index values. The element performance prediction method comprises the steps of: inputting parameter points with corresponding performance index values to be predicted, namely, prediction points; outputting the corresponding performance index values as the predicted performance index values of the prediction points if corresponding items of the prediction points exist in the model base; and performing interpolation calculation according to Delaunay triangulation to obtain the predicted performance index values of the prediction points if no corresponding items of the prediction points exist in the model base.

Description

technical field [0001] The invention relates to the field of semiconductor devices, and more specifically, to a performance prediction method of a semiconductor device and a structure optimization method of a semiconductor device. Background technique [0002] For semiconductor devices, many structural parameters and / or process parameters will affect their working performance. In practice, however, it is difficult to establish an analytical functional relationship between these parameters and device performance. Therefore, when designing a semiconductor device, for a specific design parameter, it is difficult to know in advance the performance of the semiconductor device manufactured according to the design, and therefore it is difficult to effectively determine whether the design is good or bad. [0003] In view of this, it is necessary to provide a novel method to predict the performance of semiconductor devices or to optimize the design of semiconductor devices, so as to...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G06F17/50
CPCH01L22/20
Inventor 梁擎擎朱慧珑钟汇才李萌
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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