Element performance prediction method and element structure optimization method
A performance prediction and device technology, which is applied in semiconductor/solid-state device testing/measurement, instruments, electrical components, etc., can solve problems such as the difficulty of effectively judging the pros and cons of a design, the establishment of an analytical function relationship, and the difficulty of knowing the performance of a semiconductor device in advance
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[0026] Hereinafter, the present invention is described by means of specific embodiments shown in the drawings. It should be understood, however, that these descriptions are exemplary only and are not intended to limit the scope of the present invention. Also, in the following description, descriptions of well-known structures and techniques are omitted to avoid unnecessarily obscuring the concept of the present invention.
[0027] figure 1 A schematic flowchart of a device performance prediction method according to an embodiment of the present invention is shown.
[0028] Such as figure 1 As shown, the device performance prediction method 100 according to this embodiment starts from step 101, in which step, the structural parameters and / or process parameter sets of the device are input. Such a parameter set is, for example, a parameter set selected during design, and may include gate length, threshold voltage, parasitic resistance and / or gate dielectric thickness and other ...
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