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Biphenyl molecular glass and preparation method thereof

A technology of molecular glass and biphenyl type, which is applied in the field of polyphenol biphenyl type compound and its synthesis, can solve the problems of chain entanglement and high line width roughness

Inactive Publication Date: 2014-01-29
NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] In order to solve the problems such as high line width roughness and chain entanglement in the polymer type existing in the prior art, the invention provides a biphenyl type molecular glass and a preparation method thereof

Method used

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  • Biphenyl molecular glass and preparation method thereof
  • Biphenyl molecular glass and preparation method thereof
  • Biphenyl molecular glass and preparation method thereof

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Embodiment Construction

[0027] The synthetic route of compound A and compound B is as follows:

[0028]

[0029] Using m-bromonitrobenzene and 3,5-dimethoxybromobenzene as raw materials, Compound A was synthesized through 6 steps, and Compound B was synthesized through 7 steps. 2,2'-dibromo-4,4'-biphenyldiamine was rearranged under the conditions of m-bromonitrophenyl zinc powder, and the compound 3,5-dimethoxybromobenzene was reacted with magnesium chips to obtain Grignard After reagents, add to B(OMe) at low temperature 3 3,5-dimethoxyphenylboronic acid, 2,2'-dibromo-4,4'-biphenyldiamine and 3,5-dimethoxyphenylboronic acid were obtained in Pd(PPh 3 ) 4 / K 2 CO 3 Catalytic Suzuki reaction gives 2,2'-bis(3,5-dimethoxyphenyl)-4,4'-biphenylenediamine. 2,2′-bis(3,5-dimethoxyphenyl)-4,4′-biphenyldiamine in NaNO 2 / H 2 SO 4 The diazotization reaction occurs under certain conditions, and then heated and hydrolyzed under acidic conditions to obtain 2,2'-bis(3,5-dimethoxyphenyl)-4,4'-biphenol. Ne...

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Abstract

The invention relates to biphenyl molecular glass and a preparation method thereof, namely preparation of 2, 2' 1 2 (3, 5-di-tert-butyl-di-carbonate)-4, 4'-1 2 (di-tert-butyl-di-carbonate) biphenyl compound A and 2, 2', 4, 4'-4 (3, 5-di-tert-butyl-di-carbonate) biphenyl compound B. The diazotization reaction is conducted on 2, 2' 1 2 (3, 5-di-tert-butyl-di-carbonate)-4, 4'-benzidine under the condition of NaNO2 / H2SO4, then the 2, 2' 1 2 (3, 5-di-tert-butyl-di-carbonate)-4, 4'-benzidine is heated and hydrolyzed under the acidity condition, demethylation is conducted under the condition of BBr3 to obtain 2, 2' 1 2 (3, 5-dyhydroxy-phenyl)-4, 4'-diphenol, and finally the 2, 2' 1 2 (3, 5-dyhydroxy-phenyl)-4, 4'-diphenol reacts with (t-Boc)2O to obtain the compound A. The 2, 2' 1 2 (3, 5-di-tert-butyl-di-carbonate)-4, 4'-benzidine is diazotized and then mixed with potassium iodide to obtain 2, 2' 1 2 (3, 5-di-tert-butyl-di-carbonate)-4, 4'-biphenyl-diiodine. The 2, 2' 1 2 (3, 5-di-tert-butyl-di-carbonate)-4, 4'-biphenyl-diiodine conducts Suzuki reaction with 3, 5-dimethoxy benzene boric acid under catalyst of Pd(Ph3)4 / K2CO3 to obtain 2, 2', 4, 4'-4(3, 5-dimethoxy) biphenyl. 2, 2', 4, 4'-4(3, 5-dyhydroxy-biphenyl) is obtained by demethylation through the BBr3 under low temperature and reacts with the (t-Boc)2O to obtain the compound B.

Description

technical field [0001] The invention belongs to aromatic biphenyl compounds, in particular to a polyphenol biphenyl type compound and a synthesis method thereof. Background technique [0002] Since the birth of microelectronic integrated circuit technology, it has been following the law of Moore's law. According to the "International Technology Roadmap for Semiconductors (ITRS)" (International Technology Roadmap for Semiconductors, ITRS) prediction, the rapid development of integrated circuits will continue until at least 2020, Intel has entered the 45nm era in 2007, Intel announced in March this year that it has broken through the key to 32nm It is expected to enter the 22nm technology generation in 2016. From the early days of semiconductor manufacturing, lithography has been recognized as a driving force in the development of integrated circuit manufacturing processes. Compared with other single manufacturing process technologies, lithography has made a revolutionary co...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C07C69/035C07C67/00C07C67/18C07C213/08C07C217/80
Inventor 沈应中李月琴姜丽娜
Owner NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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