Preparation method of in-situ vertically grown titanium dioxide nanosheet film
A vertical growth, titanium dioxide technology, applied in the field of nanomaterials science, can solve the problems of lack of large-area uniformity of film thickness, difficulty in fixing nano-catalysts, and low bonding strength between film and substrate.
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[0015] Cleaning: The substrate (glass sheet, silicon wafer or stainless steel sheet) is ultrasonically cleaned with acetone, absolute ethanol, and double-distilled water in sequence, each ultrasonic time is 15 minutes, and dried for later use.
[0016] Sample placement: place the cleaned substrate on the sample holder in the coating device.
[0017] Vacuuming the background: vacuuming the background to 4.0×10 -3 Pa.
[0018] Plasma cleaning the surface of the sample: turn on the microwave magnetic field, adjust the magnetic field current to 140A, turn on the microwave power supply, adjust the microwave power to 150mA, pass Ar gas into the reaction chamber, 65sccm, make the chamber pressure ~0.4Pa, start the turntable , turn on the pulse bias power supply, adjust the bias value to 200V, and the duty cycle to 50%. Generate plasma to clean the sample surface for 20 min.
[0019] Sputtering coating: reduce the Ar gas flow rate to 85 sccm. Microwave power 150mA. Turn on the sp...
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