Four-silver coated glass with low radiation and manufacturing technique thereof
A low-emission coating and manufacturing process technology, applied in glass/slag layered products, layered products, chemical instruments and methods, etc., can solve the problems of reduced visible light transmission, limited color selection, etc., and achieve improved visible light transmission. , the effect of low emissivity and good optical stability
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Embodiment 1
[0023] The magnetron sputtering coating machine that the present invention is concretely used comprises 23 AC rotating double cathodes, 8 DC plane cathodes, adopts the following table to list process parameters, uses 17 AC rotating double cathodes, and 4 DC plane cathodes, according to The film layers are plated sequentially to produce the four-silver low-emissivity coated glass of the present invention. The glass substrate should be cleaned and dried before coating, and then pre-vacuumed in the vacuum magnetron sputtering coating machine, and then the coating process starts. The process parameters and target positions are listed as follows:
[0024]
[0025]
[0026] All silicon nitride (Si 3 N 4 The ) layer uses a silicon aluminum (92:8) target, and is sputtered and deposited in an atmosphere of argon and nitrogen by means of double rotating cathodes and intermediate frequency reactive magnetron sputtering, with a power of 20-110kw and a power frequency of 20-40kHz; ...
Embodiment 2
[0051] Using a magnetron sputtering coating machine, the process parameters are listed in the following table, and 17 AC rotating double cathodes and 4 DC plane cathodes are used to produce the four-silver low-emissivity coated glass of the present invention. The process parameters and target positions are listed as follows :
[0052]
[0053]
[0054] Niobium oxide (Nb 2 o 5 The ) layer uses a niobium oxide target, and is sputtered and deposited in an atmosphere of argon and oxygen by means of double rotating cathodes and intermediate frequency reactive magnetron sputtering, with a power of 50-100kw and a power frequency of 20-40kHz;
[0055] Titanium oxide (TiO 2 ) layer is made of ceramic titanium oxide target, which is sputtered and deposited in an argon and oxygen atmosphere by means of double rotating cathodes and intermediate frequency reactive magnetron sputtering, with a power of 50-100kw and a power frequency of 20-40kHz;
[0056] The zinc oxide (ZnO) layer in...
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