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Glass surface nanofabrication method based on friction-induced selective etching

A glass surface, nano-processing technology, applied in the process of producing decorative surface effects, nano-technology, metal material coating process, etc. The effect of improving processing efficiency and low processing cost

Active Publication Date: 2012-06-20
SOUTHWEST JIAOTONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Common scanning probe microscopy processing methods rely on anodic oxidation or tribochemical oxidation, which are difficult to apply to the nanofabrication of glass and other insulators and oxide surfaces

Method used

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  • Glass surface nanofabrication method based on friction-induced selective etching
  • Glass surface nanofabrication method based on friction-induced selective etching
  • Glass surface nanofabrication method based on friction-induced selective etching

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0037] The first specific embodiment of the present invention is a method for nanofabrication of glass surfaces based on friction-induced selective etching, and its specific operation method is:

[0038] A. Install the scanning probe with a spherical tip on the atomic force microscope, fix the cleaned glass on the sample stage, start the atomic force microscope, and apply a load no higher than the critical load F to the probe c The fixed load F, and the probe scans the glass surface at a set scanning rate according to the square surface scanning trajectory, and the number of scanning cycles N is one.

[0039] B. Place the scanned glass in a HF solution with a mass concentration of 10%, and corrode it for 5 seconds.

[0040] The following are the results of five specific processing tests carried out using the method of this example:

[0041] The scanning areas of the five specific processing tests are all 3 μm×3 μm, the scanning speed v is 12 μm / s, and the fixed load F is 5 μN...

Embodiment 2

[0046] The specific operation method is: a glass surface nano-processing method based on friction-induced selective etching, and the specific operation method is:

[0047] A. Install the scanning probe with a spherical tip on the atomic force microscope, fix the cleaned glass on the sample stage, start the atomic force microscope, and apply a load no higher than the critical load F to the probe c The fixed load F, and make the probe scan the glass surface according to the square surface scanning trajectory, and scan with the set number of cycles and the set scan rate v;

[0048] B. Place the scanned glass in an HF solution with a mass concentration of 20%, and corrode it for 5 seconds.

[0049] The following are the results of five specific processing tests carried out using the method of this example:

[0050] The specific scanning area of ​​each specific processing test is 3 μm×3 μm, the applied constant load F is 5 μN, and the set scanning rate v is 12 μm / s; the set scanni...

Embodiment 3

[0054] Its specific operation method is:

[0055] A. Install the scanning probe with a spherical tip on the atomic force microscope, fix the cleaned glass on the sample stage, start the atomic force microscope, and apply a load no higher than the critical load F to the probe c The fixed load F, and the probe follows the scanning trajectory of the square surface scanning, and scans the glass surface at a set scanning rate with the number of cycles N being 1.

[0056] B. Place the scanned glass in an HF solution with a mass concentration of 15%, and corrode it for 10 seconds.

[0057] The following are the results of six specific processing tests carried out using the method of this example:

[0058] The specific scanning area of ​​the six specific processing tests is 3μm×3μm, the fixed load F is 5μN, and the scanning speed v is 90μm / s, 30μm / s, 12μm / s, 6μm / s, 3μm / s, 1.2μm / s.

[0059] image 3 It is the (silicon nitride probe scanning) topography diagram of the glass obtaine...

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Abstract

The invention discloses a glass surface nanofabrication method based on friction-induced selective etching, which is mainly applied in the processing of the glass surface micro-nanostructure. The specific operation method comprises the following steps of: installing a probe of which the tip is spherical on an atomic force microscope, fixing the cleaned glass on a sample stage, starting the atomic force microscope, applying a constant load F or a variable load F' on the probe, using the probe to scan on the glass surface along a set scanning track according to the cycle number N and the scanning speed v; and after scanning, placing the glass in an HF solution of which mass concentration is 10-20%, and finally corroding for 5-10 seconds. The method does not require a template or mask, three-dimensional nano-patterns such as slopes, steps and arrays are processed on the glass surface through one-time corrosion; and the processing flow is extremely simple, the corrosion rate is extremely high, and the glass surface nanofabrication method is simple, accurate and efficient.

Description

technical field [0001] The invention relates to a micro-nano processing method of glass. Background technique [0002] With the advancement of science and technology, micro-nano devices are widely used in biotechnology, aerospace, automobile, military, computer and communication and other fields. Glass has excellent properties such as high light transmission, insulation, biological adaptability, and low cost. It is an important material for manufacturing micro-nano devices, and is often used to process optical components, insulating substrates for micro-nano devices, biochips, and microfluidics. chips etc. [0003] According to different principles, the micro-nano processing methods currently applied to the glass surface mainly include: (1) Mask exposure technology: generally plate Cr / Au on the glass surface as a mask, then apply photoresist, and use photolithography after drying Technology transfers graphics to the glass surface. This method is complex and inefficient, a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C15/00B81C1/00B82Y40/00
Inventor 钱林茂宋晨飞周仲荣余丙军陈磊郭剑
Owner SOUTHWEST JIAOTONG UNIV
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