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Production process of ultra-high-purity isopropanol

A production process, the technology of isopropanol, is applied in the field of electronic chemicals to achieve the effect of mild reaction conditions, good safety performance and simple operation process

Inactive Publication Date: 2012-05-16
JIANGSU DENOIR TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Only low-end products with metal ion content above 1ppb can be produced in China

Method used

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  • Production process of ultra-high-purity isopropanol
  • Production process of ultra-high-purity isopropanol
  • Production process of ultra-high-purity isopropanol

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Embodiment Construction

[0030] The preferred embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings, so that the advantages and features of the present invention can be more easily understood by those skilled in the art, so as to define the protection scope of the present invention more clearly.

[0031] combine figure 1 , a production process of ultra-high-purity isopropanol, said process mainly comprising the following process steps:

[0032] (1) dehydration: the feed stream that will contain at least 98% technical grade isopropanol is sent into molecular sieve adsorption tower, and described isopropanol enters from the tower bottom of molecular sieve adsorption tower, flows out from tower top after molecular sieve dehydration, obtains High-purity isopropanol with water content less than 100ppm;

[0033] The present invention adopts international advanced high-quality aluminosilicate 3A high-efficiency molecular sieves (Φ=2-5mm), which ...

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Abstract

The invention discloses a production process of ultra-high-purity isopropanol, which comprises the following process steps of: (1) delivering a feed stream containing at least 98% of industrial grade isopropanol into a molecular sieve adsorption tower from the bottom of the molecular sieve adsorption tower, dehydrating through a molecular sieve, and then flowing out of the top of the tower to obtain high-purity isopropanol of which the moisture content is less than 100ppm; (2) filtering the high-purity isopropanol taken out of the molecular sieve adsorption tower by using a filter so as to remove particles of which the sizes are more than 1mum; and (3) transferring the high-purity isopropanol which is qualified by filtering into a distillation tower and a rectification column for rectifying, then transferring the rectified high-purity isopropanol into a condenser to be condensed into high-purity liquid isopropanol, enabling the condensed high-purity liquid isopropanol after rectifying to pass through a deionized resin tank, and deionizing through ionic resin so as to obtain ultra-high-purity isopropanol of which the metallic impurity is less than 0.1ppb. The production process disclosed by the invention is carried out under the normal pressure, and has the advantages of mild reaction conditions, simple operation processes and good safety performance.

Description

technical field [0001] The invention relates to the technical field of electronic chemicals, in particular to a production process of ultra-high-purity isopropanol. Background technique [0002] Semiconductor manufacturing operations require wafer surfaces to be as clean as possible. Sometimes, this is difficult to do, especially when wafers or chips are cleaned with an aqueous solution and then dried. The drying process often creates stains, leaving undesirable residues on the surface. This can be a hindrance that causes defects in the manufacturing process. [0003] Ultra-high-purity isopropanol due to its ability to clean after water. Isopropanol can be vaporized rapidly without leaving good performance of residues. It is used in the production process of large-scale and ultra-large-scale integrated circuits (ICs), mainly in the cleaning process. Its purity and cleanliness have a great impact on the finished products of integrated circuits. Efficiency, electrical perf...

Claims

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Application Information

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IPC IPC(8): C07C31/10C07C29/76C07C29/80
Inventor 曹小师曹传兴
Owner JIANGSU DENOIR TECH CO LTD
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