Trichlorosilane synthesis process and equipment

A technology of trichlorosilane and synthesis equipment, which is applied in the direction of silicon halide compounds, halosilanes, etc., and can solve problems such as waste and trouble

Active Publication Date: 2015-11-25
巴彦淖尔聚光硅业有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Such treatment is both troublesome and wastes raw materials such as industrial silicon, chlorine, and hydrogen.

Method used

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  • Trichlorosilane synthesis process and equipment
  • Trichlorosilane synthesis process and equipment
  • Trichlorosilane synthesis process and equipment

Examples

Experimental program
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Embodiment Construction

[0030] figure 1 One embodiment of the improved trichlorosilane synthesis apparatus of the present invention is shown. The equipment comprises: an HCl storage tank 1 for storing the HCl gas required for the reaction; a trichlorosilane synthesis furnace 2 connected in fluid communication with the HCl storage tank 1; a condenser 3 connected in fluid communication with the synthesis furnace 2, condensing The liquid phase outlet of the device 3 is connected to the condensate storage tank 4 in fluid communication, and its gas phase outlet is connected to the HCl storage tank 1 in fluid communication; the rectification 1# tower 5, its feed inlet is connected to the condensate storage tank 4 through a pipeline Rectification 2# tower 6, its feed inlet links to each other with the tower bottom of rectification 1# tower 5 through pipeline; Chlorosilane storage tank 7, with the tower top of rectification 1# tower 5 and rectification 2# tower 6 The bottom of the tower is respectively con...

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Abstract

The invention relates to a trichlorosilane synthesis process and equipment. The invention aims at disclosing an improved trichlorosilane synthesis method and equipment, which have the advantages of high yield and low cost and providing the method and equipment for continuously recycling byproducts, such as chlorosilane and silicon tetrachloride produced in the trichlorosilane synthesis process. The method comprises the following steps of: respectively separating chlorosilane and silicon tetrachloride from synthetic product materials by using a rectified separation method, gasifying the chlorosilane and the silicon tetrachloride and then introducing into a synthesis reactor, and enabling the chlorosilane content and the silicon tetrachloride content to reach a dynamic balance in the operation process. Therefore, according to the invention, the synthesis output of the trichlorosilane is improved, consumption of raw materials, hydrogen, chlorine gas and the like is reduced, and thus the production cost is reduced.

Description

technical field [0001] The invention relates to an improved trichlorosilane synthesis process and equipment. Background technique [0002] Polysilicon is the main and most important material for the semiconductor industry and the emerging solar photovoltaic power generation industry. At present, the domestic production of polysilicon usually adopts the hydrogen reduction method of trichlorosilane. Purified and purified hydrogen and trichlorosilane are supplied to the reduction furnace according to a certain ratio, and chemical reactions are carried out at a certain temperature, and the produced silicon is deposited on the silicon core in the reduction furnace. [0003] Trichlorosilane (SiHCl 3 ) is one of the main raw materials used to prepare polysilicon. The trichlorosilane synthesis process for polysilicon production mainly includes: adding industrial silicon powder and hydrogen chloride (HCl) into the synthesis furnace, and producing SiHCl at a certain reaction temper...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B33/107
Inventor 齐林喜刘犀灵王晓亮
Owner 巴彦淖尔聚光硅业有限公司
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