Method for patterning nanoscale patterns of molecules on material surfaces

Abstract

Probe-based methods for patterning a surface of a material are described. In particular, high resolution patterning of molecules on a surface of a material, such as nano-scale patterns with feature sizes of less than 30 nanometers, are described. In one aspect, a method for patterning a surface of a material includes providing a material having a polymer film. A heated, nano-scale dimensioned probe is then used to desorb molecules upon interacting with the film. The film includes a network of molecules (such as molecular glasses) which are cross-linked via intermolecular (noncovalent) bonds, such as hydrogen bonds.

Description

technical field [0001] The present invention relates to the field of probe-based methods, such as scanning probe lithography (hereinafter referred to as SPL), for patterning surfaces of materials. In particular, embodiments relate to high-resolution molecular patterning on the surface of materials, such as nanoscale patterns with feature sizes below 30 nanometers (nm). Background technique [0002] Photolithography is a process used to create patterns of two-dimensional shapes, including drawing primitives such as lines and pixels, within a layer of material such as resist coated on a semiconductor device, for example . Conventional lithography (also called optical lithography) encounters problems as feature sizes decrease (eg, below 65 nm). These problems arise from fundamental issues such as short-wavelength light sources, photoacid migration, photoresist collapse, lens system quality for short-wavelength light, and mask cost. To overcome these problems, alternative met...

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Therefore, it is difficult to obtain retention times of more than 10 years (as is usually expected in the archival field)

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