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Method for testing lead content in copper by inductively coupled plasma emission spectrometry

A plasma and inductive coupling technology, applied in the field of testing and analysis, can solve the problem of not measuring the lead content in copper, and achieve the effects of simple operation, improved detection efficiency, and shortened analysis time.

Active Publication Date: 2011-07-20
JIANGXI BLUESTAR XINGHUO SILICONE CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In the analysis and testing of samples, the ICP-AES method has been widely used, but there are relatively few reports on the use of ICP-AES to determine the lead content in copper.
[0010]At the same time, through patent search, it can be known that there is no patent application for the determination of lead content in copper by using inductively coupled plasma emission spectrometry

Method used

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  • Method for testing lead content in copper by inductively coupled plasma emission spectrometry
  • Method for testing lead content in copper by inductively coupled plasma emission spectrometry

Examples

Experimental program
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Effect test

Embodiment 1

[0035] The first step, hydrochloric acid and hydrogen peroxide dissolve the copper sample: Weigh 0.5-1 gram (accurate to 0.0001 gram) of the sample in a 250mL beaker, add 10mL of hydrochloric acid, shake well and fully wet it, let it stand for a few minutes, carefully drip Add about 5 mL of hydrogen peroxide and shake gently. After the sample is dissolved, heat it on an electric heating plate to drive away the excess hydrogen peroxide. After cooling, carefully rinse the watch glass and the beaker wall with deionized water, filter and transfer to a 100mL capacity, wash with 4% HCl until there is no copper ion and make it to volume, ready for use.

[0036] The second step, standard series solution preparation: the high-purity copper treatment method is the same as above, and this solution is used for the determination of standard series and calibration coefficients;

[0037] Among them: the determination of the correction coefficient is mainly based on 4% HCl, adding lead nation...

Embodiment 2

[0051] Embodiment 3, the method for the determination of lead content in copper by inductively coupled plasma emission spectrometry, wherein: the selection of instrument parameters: the IRIS type ICP full-spectrum direct reading spectrometer (Thermoelectric Corporation of America) instrument measurement conditions are set to long-wave 25s, short-wave 5s; sample flushing time 30s; high-frequency output power 950W; atomization pressure 25Psi, auxiliary gas flow 0.5L / min, pump speed 100rpm, atomizer position 5mm. All the other are with embodiment 1.

Embodiment 3

[0052] Embodiment 4, the method for the determination of lead content in copper by inductively coupled plasma emission spectrometry, wherein: the selection of instrument parameters: IRIS type ICP full-spectrum direct reading spectrometer (U.S. Thermoelectric Corporation) instrument measurement conditions are set to long-wave 25s, short-wave 5s; sample flushing time 30s; high-frequency output power 1350W; atomization pressure 30Psi, auxiliary gas flow 0.5L / min, pump speed 100rpm, atomizer position 10mm. All the other are with embodiment 1.

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Abstract

The invention relates to a method for testing the lead content in copper by inductively coupled plasma emission spectrometry, which comprises: firstly, dissolving a copper sample in a proper amount of hydrochloric acid and hydrogen peroxide, and washing with 4 percent HCl till copper ions are removed completely; and secondly, preparing standard solution which is used for measuring a standard factor and a calibration factor. An analytic spectral line selected in analytic measurement is Cu222.778 (150) and Pb220.353 (152). In the invention, the instrument operation parameters are measurement conditions of infrared interferometer spectrometer (IRIS) inductively coupled plasma (ICP) whole-spectrum direct-reading spectrometer (from Thermo Electron), which are as follows: the integration time is 25 seconds for long waves and 5 seconds for short waves; the sample washing time is 30 seconds; the high-frequency output power is 1,150W; the atomization pressure is 20Psi; the auxiliary air flow is 0.5L / min; the pumping speed is 100rpm; and the atomizer position is 7mm. The invention has the advantage that the detection method has the characteristics of simplicity, convenience, quickness and accuracy and has high stability.

Description

technical field [0001] The invention belongs to testing analysis technology, and mainly relates to a method for measuring lead content in copper by using inductively coupled plasma emission spectrometry. The main element determined is the content of lead in copper. Background technique [0002] Copper-containing catalysts are involved in the production process of organosilicon, and the lead content in copper-containing catalysts needs to be controlled at a very low level to ensure the normal operation of the organosilicon production process. [0003] The rapid analysis of lead less than 10 μg / g is required in the production process of organic silicon, especially the rapid analysis of lead less than 5 μg / g is beneficial to control the quality of copper. [0004] At present, it is rare to use inductively coupled plasma emission spectrometry to determine the lead content in copper. The determination of the content requires many tedious processes to complete, and many kinds of...

Claims

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Application Information

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IPC IPC(8): G01N21/73
Inventor 吴云华刘雪英杨秀伟
Owner JIANGXI BLUESTAR XINGHUO SILICONE CO LTD
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