Method for aligning metal grid line in solar cell metallization process

A technology for solar cells and metal grid lines, applied in circuits, electrical components, printing, etc., can solve the problems of losing efficiency advantages, poor repeatability, and low alignment accuracy, and achieve the effect of solving the difficulty of aligning metallized grid lines

Inactive Publication Date: 2011-06-22
ALTUSVIA ENERGY TAICANG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Currently, there are several techniques for fabricating selective emitter regions, such as anti-engraving emitters (such as Merck, Schmid, etc.), double diffusion (such as Nanjing Zhongdian, etc.), but almost all of them require high precision and high repetition. With multiple printing steps, the metal line must be placed very precise...

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  • Method for aligning metal grid line in solar cell metallization process
  • Method for aligning metal grid line in solar cell metallization process
  • Method for aligning metal grid line in solar cell metallization process

Examples

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Effect test

Embodiment 1

[0016] A method for aligning metal grid lines in a solar cell metallization process, the method comprising the following steps:

[0017] Step 1: Design a mark pattern on the four tops of the main gate design position of the silicon wafer during diffusion or other processes, and the mark pattern is a combination of two circles and a concentric square;

[0018] The width of the main grid is 1.8mm; the radius R of the circle is 0.4 mm; the side length of the inner square of the concentric square is L 1 is 0.6 mm, and the side length of the outer square is L 2 is 1 mm;

[0019] Step 2: By analyzing the mark pattern on the alignment software that comes with the Italian Baccini (Baccini) printing machine, the center position of the pattern can be accurately calculated, so that the specified area and the printed screen pattern can be accurately calculated ΔX (horizontal offset-coordinate parallel to the main grid), ΔY (longitudinal offset-coordinate perpendicular to the main grid),...

Embodiment 2

[0021] A method for aligning metal grid lines in a solar cell metallization process, the method comprising the following steps:

[0022] Step 1: Design a marking pattern on the four tops of the main gate design position of the silicon wafer during diffusion or other processes, and the marking pattern is a combination of two concentric squares;

[0023] The width of the main grid is 1.8mm; the side length of the inner square of the concentric square is L 1 is 0.6 mm, and the side length of the outer square is L 3 is 1 mm;

[0024] Step 2: By analyzing the mark pattern on the alignment software that comes with the Italian Baccini (Baccini) printing machine, the center position of the pattern can be accurately calculated, so that the specified area and the printed screen pattern can be accurately calculated ΔX (horizontal offset-coordinate parallel to the main grid), ΔY (longitudinal offset-coordinate perpendicular to the main grid), and Δθ (angular offset) of the center, accor...

Embodiment 3

[0026] A method for aligning metal grid lines in a solar cell metallization process, the method comprising the following steps:

[0027] Step 1: Design a marking pattern on the four tops of the main gate design position of the silicon wafer during diffusion or other processes, and the marking pattern is a combination of two circles;

[0028] The width of the main grid is 1.8mm; the radius R of the large circle is 0.8mm, and the radius R of the small circle is 0.2mm;

[0029] Step 2: By analyzing the mark pattern on the alignment software that comes with the Italian Baccini (Baccini) printing machine, the center position of the pattern can be accurately calculated, so that the specified area and the printed screen pattern can be accurately calculated ΔX (horizontal offset-coordinate parallel to the main grid), ΔY (longitudinal offset-coordinate perpendicular to the main grid), and Δθ (angular offset) of the center, according to these data, add compensation values ​​​​in the pri...

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PUM

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Abstract

The invention discloses a method for aligning a metal grid line in a solar cell metallization process. The method comprises the following steps of: 1, designing a mark pattern at four top ends of a main grid design position of a silicon chip respectively in a diffusing process or other processes, wherein the mark patterns are required to form an overall circular shape or an overall concentric square shape or an overall circular and concentric square shape; and 2, analyzing each mark pattern by using aligning software installed on an Italy Baccini printer to accurately calculate the central position of the pattern and accurately calculate delta X (transverse offset-a coordinate parallel to the main grid) and delta Y (longitudinal offset-a coordinate vertical to the main grid) of a specificregion and the center of a screen printing plate pattern, and adding compensation values according to the data in a printing process so as to meet the requirement on accurate printing.

Description

technical field [0001] The invention relates to the field of photovoltaic applications, in particular to a method for aligning metal grid lines in the metallization process of solar cells, so that the metal grid lines can be accurately printed on designated areas. Background technique [0002] Selective Emitter Technology – Precisely fabricate a heavily doped n+ region under the screen-printed metal lines to further reduce contact resistance and thus achieve improved conversion efficiency. Currently, there are several techniques for fabricating selective emitter regions, such as anti-engraving emitters (such as Merck, Schmid, etc.), double diffusion (such as Nanjing Zhongdian, etc.), but almost all of them require high precision and high repetition. Due to the revolutionary multiple printing steps, the metal line must be placed very precisely directly on the emitter area, otherwise, its efficiency advantage will be lost. At present, domestic solar energy companies generally...

Claims

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Application Information

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IPC IPC(8): B41M1/12H01L31/18H01L31/0224
CPCY02P70/50
Inventor 邢国强周鹏宇何恬孙海平
Owner ALTUSVIA ENERGY TAICANG
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