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Plating method for increasing laser damage threshold of high-reflectivity optical thin film

A technology of laser damage threshold and reflective optics, which is applied in optics, optical components, sputtering coating, etc.

Inactive Publication Date: 2011-06-08
FUJIAN CASTECH CRYSTALS
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  • Summary
  • Abstract
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AI Technical Summary

Problems solved by technology

Etch the surface of the substrate for 10 minutes with a 12cm ion source before plating

Method used

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Embodiment 1

[0008] Example 1: Take FS glass as the substrate, put it into filtered gasoline and ultrasonically clean it for 10 minutes, take it out, use IPA to ultrasonically clean and dry it, then wipe it clean with alcohol ether and put it into a vacuum chamber. Metal Ta and SiO2 were deposited by ion beam sputtering deposition (IBS), and the equipment was a SPECROR-Ion Beam System Manager vacuum coating machine. The substrate temperature is 150°C, and the temperature is kept constant for 30 minutes. The temperature during deposition is 80°C. The background vacuum is 9*10-6Torr, and the evaporation vacuum is 3*10-4Torr. Before plating, the surface of the substrate was etched for 10 minutes with a 12 cm ion source. The working gas of the 12cm ion source is 99.999% high-purity argon and 99.999% high-purity oxygen, the flow rates are 12sccm, 3sccm, and the RF is 5sccm argon. The target oxygen flow rate is 25 sccm. The film system design is: HR-1064 / 532-HT-808, the high refractive index m...

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Abstract

The invention discloses a plating method for increasing the laser damage threshold of a high-reflectivity optical thin film. Along with continuous increasing of laser output power and energy, higher requirements on the reflectivity and the damage threshold of a high-reflectivity film of a laser endoscopy are expressed. Most enterprises and research institutes adopt an electron gun thermal evaporation method which has the disadvantage that: a plated film is relatively loose and has severe surface defects. The technical problem to be solved of the invention is to overcome the defects of the prior art and increase the laser damage threshold of the high-reflectivity film in the aspects of a film design structure and the internal quality of a deposited film. By the method, the laser damage threshold is greatly increased, the plated film is very dense, absorption is small, an operation method is simple, and a spectrum index is stable.

Description

【Technical field】 [0001] The invention belongs to the field of optical coating, and specifically refers to a coating method for improving the laser damage threshold of a high-reflection optical film. 【technical background】 [0002] With the continuous improvement of laser output power and energy, higher and higher requirements are put forward for the reflectivity and damage threshold of laser cavity mirror high reflection film. How to prepare ultra-high reflectivity, ultra-low loss and high resistance to laser damage The ability of the all-dielectric laser reflective film has become a research hotspot for scholars at home and abroad, and it is also the goal pursued by optoelectronic companies. At present, most enterprises and research institutions adopt the method of electron gun thermal evaporation. The film layer deposited by this method is relatively loose and has serious surface defects. Some institutions use ion sources or sub-threshold lasers to pretreat the surface o...

Claims

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Application Information

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IPC IPC(8): C23C14/02C23C14/06C23C14/46G02B1/10G02B5/08
Inventor 吴小春凌文战
Owner FUJIAN CASTECH CRYSTALS
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