Preparation method of selective emitter solar cell
A technology for solar cells and emitters, applied in circuits, electrical components, climate sustainability, etc., can solve the problems of complex process steps, internal damage of silicon wafers, high energy consumption, and high cost, so as to simplify the process path and reduce high temperature Diffusion process, low cost effect
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[0031] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.
[0032] figure 1 Schematic diagram of the structure of the first screen printing plate used in the present invention; Figure 2a ~ Figure 2g Process flow chart for the preparation of solar cells of the present invention.
[0033] Concrete technological process of the present invention is as follows:
[0034] a. Surface texturing
[0035] See Figure 2a , pre-cleaning the incoming single-crystal silicon wafer 1, the pre-cleaning adopts ultrasonic waves, and adds a certain amount of cleaning and decontaminating agent. Afterwards, the silicon wafer is placed in a sodium hydroxide solution with a temperature of 75-80 °C and a mass percentage concentration of 1%-2% for surface texturing, and an appropriate amount of texturing catalyst is added to achieve a texture in the (100) crystal direction. A uniform "pyramid" textured structure 2 with a size of 1-3...
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