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NiTi shape memory alloy with surface injected with metallic elements and preparation method thereof

A metal element, memory alloy technology, applied in ion implantation plating, metal material coating process, coating and other directions, can solve problems such as insufficient improvement of corrosion resistance, biocompatibility characterization of NiTi shape memory alloy, etc. To achieve the effect of easy operation, improved wear resistance and biocompatibility, and simple technical process

Inactive Publication Date: 2010-12-15
BEIHANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, we believe that the improvement of the corrosion resistance of NiTi shape memory alloy by ion implantation of Ta or O is not good enough, and the biocompatibility of NiTi shape memory alloy before and after implantation has not been characterized.

Method used

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  • NiTi shape memory alloy with surface injected with metallic elements and preparation method thereof
  • NiTi shape memory alloy with surface injected with metallic elements and preparation method thereof
  • NiTi shape memory alloy with surface injected with metallic elements and preparation method thereof

Examples

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preparation example Construction

[0025] A method for preparing a NiTi shape memory alloy whose surface is injected with metal elements comprises the following steps:

[0026] The first step: substrate pretreatment

[0027] Select a NiTi shape memory alloy substrate with nearly equiatomic ratio, after grinding and polishing, ultrasonically clean it with acetone, absolute ethanol and deionized water for 10 min respectively;

[0028] The second step: ion implantation of Hf, Zr or Nb

[0029] (A) Put the pretreated NiTi shape memory alloy substrate into the ion implanter, and set the vacuum pressure of the ion implanter to 1×10 -4 Pa, voltage 5-8KeV, sputtering time 10-30min, carry out argon ion sputtering to remove surface impurities;

[0030] (B) Hf, Zr or Nb implantation in ion implanter:

[0031] Set the vacuum degree of the ion implanter to 1×10 -4 The injection amount of Pa, Hf, Zr or Nb elements is 0.5×10 17 ~2.5×10 17 ions / cm 2 , the voltage is 45KeV, the current is 1-4mA, the ion implantation is c...

Embodiment 1

[0034] Example 1: Preparation of NiTi shape memory alloy with Hf implanted on the surface, the Hf element implantation amount is 1.0×10 17 ions / cm 2

[0035] The first step: substrate pretreatment

[0036] Select a NiTi shape memory alloy substrate with nearly equiatomic ratio, after grinding and polishing, ultrasonically clean it with acetone, absolute ethanol and deionized water for 10 min respectively;

[0037] Step 2: Ion implantation into Hf

[0038] (A) Put the pretreated NiTi shape memory alloy substrate into the ion implanter, and set the vacuum degree to 1×10 -4 Pa, voltage 5KeV, sputtering time 20min, carry out argon ion sputtering to remove surface impurities;

[0039] (B) Hf element injection, set the vacuum pressure of the vacuum chamber to 1×10 -4 Pa, Hf element injection amount 1.0×10 17 ions / cm 2 , the voltage is 45KeV, the current is 2mA; the ion implantation is completed 30 minutes after the start of the ion implantation, and the NiTi shape memory allo...

Embodiment 2

[0056] Example 2: Preparation of NiTi shape memory alloy with Hf implanted on the surface, the Hf element implantation amount is 2.5×10 17 ions / cm 2

[0057] The first step: substrate pretreatment

[0058] Select a NiTi shape memory alloy substrate with nearly equiatomic ratio, after grinding and polishing, ultrasonically clean it with acetone, absolute ethanol and deionized water for 10 min respectively;

[0059] Step 2: Ion implantation into Hf

[0060] (A) Put the pretreated NiTi shape memory alloy substrate into the ion implanter, and set the vacuum degree to 1×10 -4 Pa, voltage 5KeV, sputtering time 20min, carry out argon ion sputtering to remove surface impurities;

[0061] (B) Hf element injection, set vacuum degree 1×10 -4 Pa, Hf element injection amount 2.5×10 17 ions / cm 2 , the voltage was 45KeV, and the current was 2mA; the ion implantation was completed 75 minutes after the start of the ion implantation, and the NiTi shape memory alloy with Hf implanted on...

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Abstract

The invention provides a NiTi shape memory alloy with a surface injected with metallic elements and a preparation method thereof. A HfO2 / TiO2, ZrO2 / TiO2 or Nb2O5 / TiO2 nanometer composite oxide film is formed by injecting metallic elements of Hf, Zr or Nb into the surface of NiTi shape memory alloy, wherein the injection quantity of Hf, Zr or Nb is 0.5*1017-2.5*1017 ions / cm2, the thickness of the nanometer composite oxide film ranges from 60nm to 100nm, and the distribution of the Ni element is inhibited at a near surface layer ranging from 0nm to 60nm. The nanometer composite oxide film improves the corrosion and wear resistance and biocompatibility of the NiTi shape memory alloy.

Description

technical field [0001] The invention belongs to the technical field of surface treatment of NiTi shape memory alloys, and in particular relates to a NiTi shape memory alloy whose surface is injected with metal elements and a preparation method thereof. Background technique [0002] Near-equal atomic ratio NiTi shape memory alloys have unique shape memory and superelasticity, and have been successfully applied as biomedical metal implants, such as bone plates, spinal orthopedic rods, orthodontic wires, and various luminal stents. . [0003] The corrosion resistance and biocompatibility of NiTi shape memory alloys are closely related to their surface state, and the spontaneously formed TiO on the surface 2 When the inert passivation film is in a normal state, it has stable mechanical properties and good corrosion resistance, so it has good biocompatibility. Once the passivation film is destroyed, repassivation is a slow process, causing local corrosion such as pitting corros...

Claims

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Application Information

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IPC IPC(8): C23C14/48C23C14/16
Inventor 李岩赵婷婷赵新青徐惠彬
Owner BEIHANG UNIV
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