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Method for preparing ordered porous aluminum oxide film-transparent conductive glass composite substrate

A technology of transparent conductive glass and porous alumina, which is applied in anodic oxidation, ion implantation plating, coating, etc., can solve the problems that the thickness of the aluminum film cannot reach the micron level, the sputtering conditions are harsh, and stress is generated, and the operation can be achieved. Relaxed environmental requirements, increased preparation repetition rate, and reduced preparation costs

Inactive Publication Date: 2010-12-01
SHANGHAI JIAO TONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, this method has strict requirements on sputtering conditions, and stress will inevitably be generated during the sputtering process, and the thickness of the aluminum film cannot reach the micron level, otherwise the aluminum film will crack during the anodic oxidation process due to excessive internal stress, limiting its further application

Method used

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  • Method for preparing ordered porous aluminum oxide film-transparent conductive glass composite substrate
  • Method for preparing ordered porous aluminum oxide film-transparent conductive glass composite substrate
  • Method for preparing ordered porous aluminum oxide film-transparent conductive glass composite substrate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] Before performing magnetron sputtering on ITO glass, it was cleaned repeatedly with ultrasonic vibration in acetone and isopropanol. After cleaning, it was dried with compressed nitrogen and immediately loaded into the sputtering chamber. The aluminum layer, the tungsten buffer layer and the titanium connection layer were deposited in a DC magnetron sputtering system.

[0025] After putting the ITO substrate into the sputtering chamber, vacuumize the whole system for more than 8 hours, so that the air pressure in the system reaches 10 -7 mbar. The purity of titanium, tungsten and aluminum targets used in sputtering are >99.5%, >99.5%, and 99.999%, respectively. The sputtering powers were 15W, 30W, and 20W; the argon pressures in the sputtering chamber were 3.0Pa, 2.4Pa, and 0.5Pa; the sputtering times were 30 seconds, 30 seconds, and 20 minutes, respectively.

[0026] The sputtered sample was heated to 300°C at a heating rate of 1°C / min, kept at a temperature of 6 hou...

Embodiment 2

[0029] Before performing magnetron sputtering on the FTO glass, it was repeatedly cleaned with ultrasonic vibration in acetone and isopropanol. After cleaning, it was dried with compressed nitrogen and immediately loaded into the sputtering chamber. The aluminum layer, the tungsten buffer layer and the titanium connection layer were deposited in a DC magnetron sputtering system.

[0030] After putting the FTO substrate into the sputtering chamber, vacuumize the whole system for more than 8 hours, so that the air pressure in the system reaches 10 -7 mbar. The purity of titanium, tungsten and aluminum targets used in sputtering are >99.5%, >99.5%, and 99.999%, respectively. The sputtering powers were 15W, 30W, and 20W; the argon pressures in the sputtering chamber were 3.0Pa, 2.4Pa, and 0.5Pa; the sputtering times were 30 seconds, 30 seconds, and 20 minutes, respectively.

[0031] The sputtered sample was heated to 400°C at a heating rate of 1°C / min, kept at a temperature of 6...

Embodiment 3

[0034] Before performing magnetron sputtering on ITO glass, it was repeatedly cleaned by ultrasonic vibration in acetone and isopropanol. After cleaning, it was dried with compressed nitrogen and immediately loaded into the sputtering chamber. The aluminum layer, the tungsten buffer layer and the titanium connection layer were deposited in a DC magnetron sputtering system.

[0035] After putting the ITO substrate into the sputtering chamber, vacuumize the whole system for more than 8 hours, so that the air pressure in the system reaches 10 -7 mbar. The purity of titanium, tungsten and aluminum targets used in sputtering are >99.5%, >99.5%, and 99.999%, respectively. The sputtering power is 15W, 30W, 20W; the argon pressure in the sputtering chamber is 3.0Pa, 2.4Pa, 0.5Pa respectively; the sputtering time is 30 seconds, 30 seconds, 60 minutes respectively.

[0036] The sputtered sample was heated to 350°C at a heating rate of 1°C / min, kept for 6 hours, and then cooled to room...

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Abstract

The invention discloses a method for preparing an ordered porous aluminum oxide film-transparent conductive glass composite substrate in the technical field of conducting materials. The method comprises the following steps of: respectively depositing a titanium layer, a tungsten layer and an aluminum layer on the transparent conductive glass by using a magnetron sputtering method; performing annealing heat treatment and anodic oxidation treatment on the aluminum layer obtained by sputtering to obtain a porous anodic aluminum oxide film; and finally, reaming the porous anodic aluminum oxide film and removing an oxidized barrier layer to prepare an ordered porous aluminum oxide film. The method relieves the stress of the aluminum layer subjected to sputtering, and enhances the binding force between the aluminum layer, the tungsten layer and the titanium layer and the transparent conductive glass substrate. Therefore, the bubbling and falling-off phenomena during aluminum anodic oxidation are avoided; a highly ordered porous aluminum oxide film is prepared on the transparent conductive glass; and the pore diameter is accurately controllable in a range from 40 to 80 nm.

Description

technical field [0001] The invention relates to a method in the technical field of conductive materials, in particular to a method for preparing an ordered porous aluminum oxide film-transparent conductive glass composite substrate. Background technique [0002] The preparation of large-scale ordered nanorods (tubes) arrays on transparent conductive glass has attracted great attention in nanophotocatalytic devices and photovoltaic devices. Large-scale vertically ordered nanoarrays have a larger specific surface area than planar films, so they will produce higher photocatalytic efficiency or photoelectric conversion efficiency. Moreover, the nano-ordered structure can play a role in fixing the flexible material added later, which increases the loading amount of the flexible material and prolongs the service life of the device. However, how to efficiently fabricate large-scale ordered nanorod (tube) arrays on transparent conductive glass still lacks a universal method. [00...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/18C23C14/58C25D11/04C25D11/24
Inventor 姜传海任鑫李东栋
Owner SHANGHAI JIAO TONG UNIV
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