Exposing machine and exposing method thereof

Abstract

The invention discloses an exposing machine and an exposing method thereof. A strip light source irradiating towards the shift stroke of an exposing platform is at least generated at a position inside an exposing chamber relative to the upper part or the lower part of the shift stroke of the exposing platform; and the exposing platform receives the irradiation of the strip light source in a mode of relative displacement with the strip light source at a predetermined speed so that a processed object on the exposing platform finishes exposure and development. The number of bulbs can be greatly reduced, the volume of the integral exposing machine is relatively reduced, the equipment cost is reduced, and the heat concentration phenomenon of the exposing chamber is reduced; and in particular, the exposing platform passes through the exposing platforms in turn by adopting a mode of continuous cyclic conveying so as to promote the processing capacity of the exposing machine.

Description

technical field [0001] The present invention relates to an exposure and development technology of an exposure machine, and aims to provide an exposure machine that is less likely to generate heat accumulation and can relatively reduce equipment volume and cost, and an exposure method related thereto. Background technique [0002] Press, when the general printed circuit board or semiconductor chip is exposed and developed, a layer of photoresist is first coated on the surface of the processed object, and then the circuit wiring pattern on the original is mapped to the surface of the processed object by the irradiation of the light source. On the photoresist layer, so that the chemical properties of the photoresist layer change due to the irradiation of the light source, and then use the photoresist remover to remove the photoresist irradiated by the light source or the unexposed photoresist from the surface of the processed object , to form a line layout corresponding to the ...

AI Technical Summary

Problems solved by technology

[0007] However, such a design will make the structure of the overall exposure machine more complicated, and the body of the overall exposure machine will also become relatively larger; especially, it is necessary to use a bulb with a large wattage, and the life of a bulb with a large wattage is generally quite short. , not only increases the replacement frequency of bulbs, but also relatively increases the invisible production cost

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