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Method for surface regulation of silicon material for solar cells

A technology of solar cells and silicon materials, applied in the field of solar cells, can solve the problems of uncontrollable, uneven suede, unsuitable application, etc., and achieve the effects of controllable operation, increasing light absorption area, and ensuring uniformity and regularity.

Inactive Publication Date: 2010-10-20
UNIV OF ELECTRONIC SCI & TECH OF CHINA
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  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the treatment of the illuminated surface of the battery by this method is formed spontaneously and is not subject to human control. The formed "velvet surface" is uneven and extremely irregular, and because the method is uncontrollable, its repeatability is poor, so it is not suitable for Application in mass production

Method used

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  • Method for surface regulation of silicon material for solar cells
  • Method for surface regulation of silicon material for solar cells
  • Method for surface regulation of silicon material for solar cells

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Embodiment Construction

[0016] The present invention will be further described below in conjunction with accompanying drawing:

[0017] The object of the present invention is to provide a method for regularizing the surface of a silicon material for solar cells. The method is characterized in that a combination of photolithography, mask technology and alkali wet etching technology is used to deposit a mask layer on the silicon surface before performing alkali wet etching on the silicon surface, and use the mask plate to clean the silicon surface. The surface mask layer is patterned, so that the etching of the silicon surface is selective and controllable.

[0018] A technical scheme of a method for regularizing the surface of a solar cell silicon material in the present invention is:

[0019] Using the principle of corrosion to form a pyramid structure on the silicon surface can increase the light-receiving surface area and reduce the reflectivity of sunlight, but the corrosion method is extremely u...

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Abstract

The invention discloses a method for the surface regulation of a silicon material for solar cells. In the method, photoetching and mask film technology and alkaline wet-method corrosion technology are combined, a layer of mask film is deposited on the surface of silicon before the alkaline wet-method corrosion of the surface of the silicon, and the film layer on the surface of the silicon is patterned by a mask film pattern to make the corrosion of the surface of the silicon selectable and controllable. While performing the alkaline wet-method corrosion of the surface of the silicon to increase the light absorption area of the surface of the silicon, the method ensures the uniformity and regularity of the surface of the silicon. The method has the advantages of controllable operation, simplicity, easy implementation, high repeatability and easy large-scale production application.

Description

technical field [0001] The invention relates to the technical field of solar cells, in particular to a method for regularizing the surface of silicon materials used in solar cells. Background technique [0002] Solar cells are optoelectronic semiconductor devices that convert light energy into electrical energy. With the success of solar cells in the "Pioneer 1", more and more satellites use solar cells as the main power source. At the same time, solar cells are on the ground The applications on the Internet are also more and more widely, such as lighting, radio relay, television relay and power supply of buildings and so on. According to different materials, solar cells can be divided into silicon solar cells and compound solar cells, among which silicon solar cells are the most widely used. In order to reduce the reflection loss of reflected light on the surface of the silicon cell, the principle of corrosion is used to make the illuminated surface of the silicon solar ce...

Claims

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Application Information

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IPC IPC(8): H01L31/18
CPCY02P70/50
Inventor 吴志明蒋亚东姜晶赵国栋张安元
Owner UNIV OF ELECTRONIC SCI & TECH OF CHINA
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