Fan-shaped gas inlet spray head for metal organic chemical vapor deposition equipment

Abstract

The invention discloses a fan-shaped gas inlet spray head for metal organic chemical vapor deposition equipment, which comprises an enclosed shell body. The shell body comprises an upper plate, a middle plate and a lower plate; a gas inlet chamber for allowing the gas to enter is formed between the upper plate and the middle plate; a cooling chamber is formed between the middle plate and the lower plate; and the gas inlet chamber is divided into a plurality of fan-shaped areas isolated from one another. A plurality of heat-conducting thin tubes are fixed between the middle plate and the lower plate in each fan-shaped area, the thin tubes extend out of the cooling chamber in the height direction of the shell body, the open ends of the thin tubes are communicated with the gas inlet chamber, and the outlet ends of the thin tubes face the surface of an adjacent substrate; and mutually different reaction gases are introduced into at least two fan-shaped areas of the gas inlet chamber. The different reaction gases can be uniformly delivered to a reaction chamber through the fan-shaped areas. The pre-reaction can be reduced and the high-quality epitaxial growth of materials can be realized by controlling the rotational speed of the substrate, and a common epitaxial growth mode can be realized by improving the rotational speed of the substrate.

Description

technical field [0001] The invention relates to the technical field of semiconductor equipment manufacturing, in particular to a fan-shaped air inlet nozzle used in metal organic compound chemical deposition equipment. Background technique [0002] MOCVD (Metal Organic Chemical Vapor Deposition) equipment, that is, Metal Organic Chemical Vapor Deposition equipment, is the key equipment for the research and production of compound semiconductor epitaxial materials, especially suitable for large-scale industrial production of compound semiconductor functional structural materials, and cannot be replaced by other semiconductor equipment The core semiconductor equipment is the main means of producing semiconductor optoelectronic devices and microwave device materials in the world today, and is an indispensable strategic high-tech semiconductor equipment for the development of today's information industry and national defense high-tech breakthroughs. [0003] To grow thin film mat...

AI Technical Summary

Problems solved by technology

[0005] The nozzle design currently used in vapor deposition equipment can basically send two kinds of reaction gas sources into the reaction chamber separately, but they have met and mixed before reaching the substrate, and a pre-reaction occurs at a high temperature, and the products of the pre-reaction Deposits on substrate, affects crystal quality

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