Electroplating device of copper plating of graphite powder and technique
An electroplating device and electroplating process technology, applied in the direction of electrolysis process, electrolysis components, etc., can solve the problems of unfavorable copper deposition, low deposition rate, low limit current, etc. Effect
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Embodiment 1
[0041] The base material is 200 mesh flake graphite, and the specific operation steps are as follows:
[0042] Graphite pretreatment
[0043] A: Use muffle furnace for degreasing at high temperature to degrease, temperature: 600°C, time: 30min;
[0044] B: Ultrasonic roughening with concentrated nitric acid ultrasonic roughening, temperature: room temperature, time: 20min;
[0045] C: Wash with distilled water until neutral;
[0046] flow copper plating
[0047] Plating solution preparation and operating conditions: copper sulfate 10g dm -3 , graphite powder 15g·dm -3 , concentrated sulfuric acid 5cm 3 · dm -3 , Glacial acetic acid 0.2cm 3 · dm -3 , formamide 0.3cm 3 · dm -3 , the number of plating tank combinations is 2; the temperature is 60°C; the flow rate of the plating solution is 12dm -3 min -1 ;Ultrasonic frequency 20kHz current density 30A·dm -2 ,; time 20min.
[0048] (3) Post-treatment of graphite powder copper plating
[0049] A: Copper-clad graphite...
Embodiment 2
[0053] Base-material is 200 order graphite flakes, and difference from embodiment 1 is:
[0054] flow copper plating
[0055] Plating solution preparation and operating conditions: copper sulfate 10g dm -3 , graphite powder 15g·dm -3 , sodium hypophosphite 5g·dm -3 , concentrated sulfuric acid 5cm 3 · dm -3 , Glacial acetic acid 0.2cm 3 · dm -3 , formamide 0.3cm 3 · dm -3 ; The number of plating tank combinations is 2; the temperature is 60°C; the flow rate of the plating solution is 12dm -3 min -1 ; Ultrasonic frequency 20kHz; Current density 30A·dm -2 ; Time 20min.
[0056] All the other steps are the same as in Example 1.
[0057] The copper clad graphite powder composite material prepared in this example has a mass fraction of copper of 60%, and the coating is dense and uniform.
Embodiment 3
[0059] Base-material is 200 order graphite flakes, and difference from embodiment 1 is:
[0060] flow copper plating
[0061] Plating solution preparation and operating conditions: copper sulfate 8g dm -3 , graphite powder 15g·dm -3 , sodium hypophosphite 10g·dm -3 , concentrated sulfuric acid 5cm 3 · dm -3 , Glacial acetic acid 0.2cm 3 · dm -3 , formamide 0.3cm 3 · dm -3 ; The number of plating tank combinations is 2; the temperature is 60°C; the flow rate of the plating solution is 12dm -3 min -1 ; Ultrasonic frequency 20kHz; Current density 30A·dm -2 ; Time 20min.
[0062] All the other steps are the same as in Example 1.
[0063] The copper-clad graphite powder composite material prepared in this example has a mass fraction of copper of 65%, and the coating is dense and uniform.
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