Epitaxial growth design and method for realizing high-efficiency 1.5mu m communication band laser structure by adopting cylindrical InGaSb quantum dots
A technology of epitaxial growth and quantum dots, which is applied to the structure of the active region, ion implantation plating, coating, etc., can solve the problems of poor temperature stability, difficulty in high-density integration, and small effective mass of electrons, so as to improve performance, Enhanced overall performance, threshold current, and improved maximum optical power output
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[0011] like figure 1 As shown, the InGaSb columnar quantum dot high-efficiency 1.5μm communication band laser structure includes: n-type GaAs substrate (1), n-type GaAs buffer layer (2), n-type AlSb / GaSb superlattice buffer layer (3), n-type Al 0.9 Ga 0.1 Sb lower confinement layer (4), Al 0.3 Ga 0.7 Sb lower waveguide layer (5), columnar InGaSb quantum dot layer (6), Al0.3Ga0.7Sb upper waveguide layer (7), p-type Al 0.9 Ga 0.1 Sb upper confinement layer (8), p-type GaSb ohmic layer (9). The substrate (1) is the substrate for material epitaxial growth, using a Si-doped GaAs substrate; growing a 0.5 μm GaAs buffer layer (2); growing a 0.2 μm AlSb / GaSb superlattice buffer layer (3); the lower limit is Al with a thickness of 1.2 μm and an Al content of 0.9 0.9 Ga 0.1 Sb layer (4); the lower waveguide layer is Al with a thickness of 0.35 μm and an Al content of 0.3 0.3 Ga 0.7 Sb layer (5); the active region is a columnar InGaSb quantum dot layer (6) grown using 10-15 per...
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