Method for preparing high purity, high density and high yield Si3N4/SiO2 coaxial nano-cable array
A nano-cable, high-density technology, applied in the manufacture of coaxial cables, nano-structure manufacturing, cable/conductor manufacturing, etc. The effect of high product yield, controllable length, simple equipment and process
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[0028] The present invention proposes a Si 3 N 4 / SiO 2 A method for preparing a coaxial nanocable array, characterized in that the method uses a pyrolysis organic precursor to synthesize Si on a catalyst-coated substrate. 3 N 4 / SiO 2 A coaxial nano-cable array, and includes the following steps and content:
[0029] (1) The polysilazane used has high silicon and nitrogen contents, exceeding 15at% and 20at% respectively, and the oxygen content is no more than 3at%, and the Si deposited by the method is 3 N 4 / SiO 2 The only silicon source for coaxial nanocable arrays.
[0030] (2) The polymer precursor is catalyzed or uncatalyzed thermal cross-linking and curing at 160-300°C for 0.5-2 hours under the atmosphere of high-purity nitrogen, argon or ammonia, and decomposes to remove water and most of the hydrogen to become semi- Transparent SiCN amorphous solid.
[0031] (3) The translucent amorphous solid is crushed in a high-wear-resistant agate container, then mixed wit...
Embodiment 1
[0039] Example 1: The initial raw material is polysilazane perhydropolysilazane, which is a light yellow viscous liquid at room temperature. It is cured by thermal crosslinking without catalyst at 260°C for 0.5h, the protective atmosphere is nitrogen, and the air flow rate is 40ml / min to obtain translucent Amorphous SiCN solid. The SiCN solid was ground in an agate mortar, then mixed with high wear-resistant PZT balls with a diameter of 2 mm, and ground for 10 hours on a high-energy ball mill in a polyurethane ball mill jar. Take 0.3 g of solidified and pulverized precursor powder, and evenly distribute it on the bottom of the corundum crucible, then cut a small piece of silicon wafer coated with a 5 nm thick Fe film and place it on a ZrO2 layer about 2 mm high above the powder. 2 on the stand. Then put it in a tube furnace for high-temperature pyrolysis, keep it at 1250 °C for 2 hours, and then cool it naturally to room temperature to prepare Si 3 N 4 / SiO 2 Coaxial nanoc...
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