Sorbent for mutual separation of MA/RE in high-level waste and preparation thereof
A high-level radioactive waste and adsorbent technology, applied in silicon compounds, radioactive purification, other chemical processes, etc., can solve the safety concerns of post-processing cycles, low performance such as acid resistance and radiation resistance, and chemical instability, etc. The chemical stability of the solvent, ensuring the safety of the post-processing cycle, and the effect of good identification ability
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Embodiment 1
[0028] The preparation of embodiment 1 adsorbent
[0029] Dissolve 100 grams of 2,6-bis-(5,6-di-n-butyl-1,2,4-triazin-3-yl)-pyridine in 1000 mL of dichloromethane and mix well; add 300 grams of coating polymer macroporous SiO 2 (SiO 2 -P) Stir evenly to volatilize most of the dichloromethane until the material is in a nearly dry state, and then vacuum-dry the nearly dry material at 45° C. for 24 hours.
Embodiment 2
[0030] The preparation of embodiment 2 adsorbent
[0031] Dissolve 100 grams of 2,6-bis-(5,6-di-n-butyl-1,2,4-triazin-3-yl)-pyridine in 1500 mL of dichloromethane and mix well; add 600 grams of coating polymerization macroporous SiO 2 (SiO 2 -P) Stir evenly to volatilize most of the dichloromethane until the material is in a nearly dry state, and then vacuum-dry the nearly dry material at 45° C. for 24 hours.
Embodiment 3
[0032] Embodiment 3 preparation of adsorbent
[0033] Dissolve 100 grams of 2,6-bis-(5,6-di-n-butyl-1,2,4-triazin-3-yl)-pyridine in 3000 mL of dichloromethane and mix well; add 1500 grams of coating polymer macroporous SiO 2 (SiO 2 -P) Stir evenly to volatilize most of the dichloromethane until the material is in a nearly dry state, and then vacuum-dry the nearly dry material at 45° C. for 24 hours.
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