Alignement scanning validation simulating device and its control method

Abstract

The invention provides the alignment scanning verification simulator of a piece of lithography equipment and a control method thereof, and the device comprises an alignment scanning verification simulation controller, an alignment scanning controller, an alignment scanning position transmitter, an alignment scanning position information collector, an alignment scanning light radiation information generator, an alignment scanning light radiation information collector, and alignment scanning signal processor, wherein, the alignment scanning verification simulation controller sets the working state of the alignment scanning position information collector and the alignment scanning light radiation information collector, leading the alignment scanning position information collector to be capable of receiving alignment scanning position data information generated by the alignment scanning position transmitter, and the alignment scanning light radiation information collector to be capable of receiving alignment scanning light radiation information generated by the alignment scanning light radiation information generator.

Description

technical field [0001] The present invention relates to the field of lithography, and in particular to an alignment scan verification simulation device for lithography equipment, and a control method for alignment scan verification simulation of an alignment system in a lithography equipment using the alignment scan verification simulation device . Background technique [0002] In industrial devices, due to the need for high precision and high productivity, a large number of sensor devices and control systems for high-speed real-time measurement, signal sampling, data acquisition, data exchange and communication transmission are distributed. These systems require us to use various methods to realize the control of sensor detection, signal sampling control, data acquisition control, data exchange control and data transmission communication. Devices that require this control include: integrated circuit manufacturing lithography devices, flat panel display panel lithography de...

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Problems solved by technology

[0004] In the previous above-mentioned equipment, in the lithography equipment similar to the alignment system described in Chinese patent CN200710044559.4, the alignment scanning verification simulation cannot be performed, and the alignment system verification and simulation in the lithography equipment cannot be realized, which is inconvenient Simulate and evaluate the alignment performance of the alignment system, but cannot verify the authenticity and completeness of the alignment system performance simulation and evaluation, and cannot verify and evaluate the adaptability of the alignment system under different alignment scenarios and process conditions

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