Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Seedling cultivation substrate using mushroom residue as raw material and preparation method thereof

A technology for raising seedling substrates and mushroom residues, applied in the fields of botanical equipment and methods, soilless cultivation, cultivation, etc., can solve the problems of affecting the quality of substrates, simple fermentation process, etc., and achieve the improvement of physical properties, rich nutrition, and protection of ecological resources. Effect

Inactive Publication Date: 2009-05-20
INST OF SOIL & FERTILIZER XINJIANG ACAD OF AGRI SCI
View PDF2 Cites 37 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method still needs to consume commercial peat, and the fermentation process is simple, which affects the quality of the substrate

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0012] The organic substrate with mushroom dregs as raw material, the substrate includes components and parts by volume: mushroom dregs 1, vermiculite 1, perlite 1, fermentation aid 0.0001; fermentation aids are putrefactive bacteria and bran press Mixture with a weight ratio of 1:10. The decay-promoting bacterial agent is a commercially available commercial bacterial agent, specifically the Rw decay-promoting agent produced by Renyuan Biotechnology Development Co., Ltd., Hebi City, Henan Province.

[0013] The above-mentioned organic matrix of the present embodiment, its preparation method adopts following steps:

[0014] a. Preparation of fermentation aids: Mix the commercial rot-promoting bacteria agent and bran evenly in proportion;

[0015] b. Fermentation product preparation: After the rod-shaped compost (mushroom dregs) of artificially planted round mushrooms is broken and dispersed, the prepared fermentation aid is added, infiltrated and mixed;

[0016] c. Aerobic fe...

Embodiment 2

[0019] The difference between this example and Example 1 is that the matrix includes components and parts by volume: mushroom dregs 2, vermiculite 1, perlite 2, and fermentation aid 0.0005. The production process was basically the same as in Example 1, and took 35 days.

[0020] After testing, the matrix of the present embodiment has a bulk density of 0.205g.cm -3 , total porosity 73.57%, ventilation porosity 7.79%, water holding porosity 65.78%, water-air ratio 8.44, pH value 7.08, EC (soluble salt content) value 2.74ms.cm-, organic matter 353g.kg-, available nitrogen 363.3mg.kg-, available phosphorus 570.4mg.kg-, available potassium 4480mg.kg-, and good lumpiness, the comprehensive performance index is significantly better than the composite matrix of peat and vermiculite with a volume ratio of 2:1. The bulk density and total porosity of the mushroom dregs composite matrix in this example are all within the suitable range for seedling cultivation, the contents of available ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a seedling cultivation matrix taking mushroom residue as raw material, as well as a manufacture method thereof. The matrix comprises the following components in volume portion: 1 to 3 portions of mushroom residue, 1 to 2 portions of vermiculite, 1 to 2 portions of perlite and 0.0001 to 0.0005 portion of fermentation promoter, wherein the fermentation promoter is a mixture of decay promoting microbial agent and bran with the weight ratio of 1 to 10. The matrix has the advantages of fully utilizing mushroom residue waste of agricultural production, using no peat at all and saving ecological resources, along with rich nutrition, good porosity, excellent physical properties, low cost and simple manufacture.

Description

1. Technical field [0001] The invention relates to a soilless cultivation technique, in particular to a seedling raising substrate using mushroom dregs as a raw material and a preparation method thereof. 2. Background technology [0002] With the progress and development of my country's facility agriculture, industrialized seedling raising technology has been promoted and applied from vegetable cultivation to garden plants and even field crops. The selection and preparation of seedling substrate is an important content of industrial seedling technology. At present, most seedling substrates use peat as the main raw material. However, since peat is a non-renewable resource with limited reserves, large-scale mining will cause devastating damage to the ecological environment. In order to avoid excessive exploitation of peat resources and improve the comprehensive performance of the substrate, researchers have recently developed some new seedling substrates. For example, the Ch...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): A01G31/00
Inventor 张云舒徐万里刘骅周勃张殿宇
Owner INST OF SOIL & FERTILIZER XINJIANG ACAD OF AGRI SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com