Production technology for anti-reflection film of solar cell
A production process and anti-reflection coating technology, applied in the manufacture of circuits, electrical components, final products, etc., can solve the problems of easy process fluctuations, burn-through, poor blocking ability of harmful impurities, etc., and achieve enhanced high-temperature penetration blocking effect, Effects of reduced radiation damage and wide process temperature range
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[0016] Such as figure 2 Shown, the concrete production technological process of the present invention is as follows:
[0017] 1. Clean single crystal silicon wafer: clean the silicon wafer that has been diffused to form a PN junction and has been cleaned by plasma edge removal and PSG (phosphosilicate glass) to keep the surface of the silicon wafer dry and free of water stains;
[0018] 2. Inserting the wafer: put the clean and dry silicon wafer N + The layer is vertically inserted into the carrier graphite boat (note that the whole boat must be filled, if it is insufficient, it must be replaced with a companion piece), and then sent into the reaction chamber at a speed of 600mm / min;
[0019] 3. Constant temperature: the boat is sent into the reaction chamber. The ambient temperature in the reaction chamber is 480°C. Due to the influence of the cold end effect, the temperature will drop by 60°C. In order to ensure that the film density in the entire reaction chamber is unifo...
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