Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for preparing porous silicon dioxide nano sphere with special structure on surface and porous silicon dioxide nano sphere

A technology of porous silica and special structure, applied in the direction of silicon oxide, nanostructure manufacturing, nanotechnology, etc., to achieve the effects of controllable material structure and morphology, high thermal stability, and large specific surface area

Inactive Publication Date: 2009-03-25
TECHNICAL INST OF PHYSICS & CHEMISTRY - CHINESE ACAD OF SCI
View PDF0 Cites 29 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This patented technology allows creating small particles called polytasils (PTS) inside tiny holes made from an oxidized metal network framework. These PTS exhibit unique properties such as being able to control their shape and sizes over several orders of magnitude within these dimensions. They also contain many types of cavities and openings at various angles around them, which makes up the space between each other. When they were mixed together during this mixing procedure, there was no apparent difference among themselves due to how well the components had been added separately beforehand. Overall, this new type of product provides excellent performance characteristics including enhanced heat storage efficiency, reduced pressure drop when injected into gases, increased durability against corrosion compared to existing products containing conventional ceramics.

Problems solved by technology

The technical problem addressed by this patented technology relates to finding ways for creation of porated silicon oxide particles that are suitable for various uses like biochemistry, medicine, electronics, sensory devices, energy storage systems, fuel cells, membranes, water purification, gas separation, and more.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for preparing porous silicon dioxide nano sphere with special structure on surface and porous silicon dioxide nano sphere
  • Method for preparing porous silicon dioxide nano sphere with special structure on surface and porous silicon dioxide nano sphere
  • Method for preparing porous silicon dioxide nano sphere with special structure on surface and porous silicon dioxide nano sphere

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0041] Dissolve 0.2-0.5 g of cetyltrimethylammonium bromide in 30-50 ml of distilled water (conductivity 18.2 MΩ), stir at room temperature for 10-20 minutes, respectively add 0.2-0.3 ml of 25 wt% ammonia water, 10-30 Add milliliters of anhydrous ether into the solution, stir rapidly for 10-20 minutes, add 1-1.5 milliliters of tetraethoxysilane (purity not less than 99.9%) into the solution, seal and keep stirring for 14-34 hours. The solid precipitate obtained by the reaction is filtered, washed with water, dried in air at 50-70 degrees Celsius, and finally calcined at 400-700 degrees Celsius for 4-6 hours. Take a small amount of dried sample and redisperse it in ethanol, spot it on the copper grid for transmission electron microscope observation, then observe with transmission electron microscope and scanning electron microscope, as figure 1 shown in a and 1c.

[0042] figure 1 a, b and figure 1 c, d are scanning electron micrographs and transmission electron micrographs ...

Embodiment 2

[0044] Dissolve 0.2-0.5 g of cetyltrimethylammonium bromide in 30-50 ml of distilled water (conductivity 18.2 MΩ), stir at room temperature for 10-20 minutes, respectively add 0.2-0.3 ml of 25 wt% ammonia water, 10-30 Add milliliters of ethylene glycol monoethyl ether into the solution, stir rapidly for 10-20 minutes, add 1-1.5 milliliters of tetraethoxysilane (purity not less than 99.9%) into the solution, seal and keep stirring for 20-26 hours. The solid precipitate obtained by the reaction is filtered, washed with water, dried in air at 50-70 degrees Celsius, and finally calcined at 400-700 degrees Celsius for 4-6 hours. Take a small amount of dried sample and redisperse it in ethanol, spot it on the copper grid for transmission electron microscope observation, then observe with transmission electron microscope and scanning electron microscope, as figure 2 a-c and 2d-f are shown.

[0045] figure 2 It is a scanning electron micrograph and a transmission electron microgra...

Embodiment 3

[0047] Get the porous silica nanospheres with a special structure on the surface and the silica nanospheres with an ordered pore structure prepared in Examples 1 and 2, respectively, after degassing treatment at 150 degrees Celsius, in nitrogen adsorption-degassing Attached analyzer (Quantachrome NOVA 4200e, Quanta, USA) to measure its nitrogen adsorption characteristics at -196 degrees Celsius. See the experimental results image 3 The middle curve shows that the porous silica nanospheres with a special surface structure and the silica nanospheres with an ordered pore structure have good gas adsorption properties. image 3 a. image 3 c is the nitrogen adsorption-desorption isotherm and pore size distribution curve of porous silica nanospheres with a special surface structure; image 3 b. image 3 d is the nitrogen adsorption-desorption isotherm and pore size distribution curve of ordered porous silica nanospheres with special surface structure. image 3 a. image 3 b sh...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
The average particle sizeaaaaaaaaaa
Specific surface areaaaaaaaaaaa
D valueaaaaaaaaaa
Login to View More

Abstract

The invention belongs to the technical field of nanometer material preparation, and particularly relates to a method for preparing a porous silicon dioxide nanometer sphere with a surface of special structure and appearance in an ether/water system, and the obtained porous silicon dioxide nanometer sphere with the surface of special structure and appearance by the method. When triethoxy silane is hydrolyzed in different ether/water systems and undertakes a dynamic template assembly process under the alkaline condition, the porous silicon dioxide nanometer sphere and a porous silicon dioxide nanometer hollow sphere are respectively obtained. The method has simple preparation process, low cost, mild reaction condition, and controlled prepared material structure and appearance. The prepared porous silicon dioxide nanometer sphere and the porous silicon dioxide nanometer hollow sphere are provided with abundant microporous and mesoporous, larger specific surface area and pore volume as well as good structural stability, and can be used as the carrier of catalyst or adsorbent , drug carrier (controlled release), nanometer reactor and separation material and the like.

Description

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Owner TECHNICAL INST OF PHYSICS & CHEMISTRY - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com